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One-step amination of MWCNTs in RF-dielectric barrier discharge Ar-N2-H2 plasmas
被引:2
作者:
Abdel-Fattah, Essam
[1
,2
]
Ogawa, Daisuke
[3
]
Nakamura, Keji
[3
]
机构:
[1] Prince Sattam Bin Abdulaziz Univ, Coll Sci & Humanities, Dept Phys, POB 173, Al Kharj 11942, Saudi Arabia
[2] Zagazig Univ, Fac Sci, Phys Dept, Zagazig 44519, Egypt
[3] Chubu Univ, Dept Elect & Elect Engn, 1200 Matsumoto Chop, Kasugai, Aichi 4878501, Japan
来源:
关键词:
Ar-N2-H2;
plasma;
MWCNT;
Plasma functionalization;
XPS;
Raman;
WALLED CARBON NANOTUBES;
ELECTROCATALYTIC ACTIVITY;
FUNCTIONALIZATION;
SURFACE;
D O I:
10.1016/j.vacuum.2024.113002
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
Plasmas technology is a simple way to functionalize the surface of multi -wall carbon nanotube MWCNT. Homogenous plasma of Ar-N2-H2 gas mixture was generated in radio frequency RF dielectric barrier Discharge DBD at discharge power of 60 W and total pressure of 500 Pa. The active plasma species was monitored by optical emission spectroscopy OES. While the untreated and treated MWCNTs were investigated with various techniques. The result from OES shows complex spectrum with spectral line/bands related various species such as OH, N2, CN, C2, H alpha and Are I, confirming the rich plasma environment, as well as possible active interaction between the MWCNTs and the plasma species. The TEM images of the treated samples revealed the roughness of the CNT outer surface. The X-ray photo electron emission XPS results confirm the presence of nitrogen -based functional groups (C-N--C, C-NH--O and (C--O)-N-(C--O)) on the plasma treated MWCNTs. Raman spectrum analysis confirms the functionalization of the treated MWCNTs as the ID/IG ratio increased for the treated sample. The Ar-N2-H2 plasma treatment of MWCNTs undamaged the MWCNTs structure and preserved integrity as observed by XRD result and SEM image.
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页数:6
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