High-density light-emitting diodes (LEDs) show great potential for next-generation micro-display technology due to their high resolution, long operational life, high brightness and high efficiency. However, conventional fabrication methods for high density LEDs suffer from issues such as growth difficulties, etch damage, and ion implantation damage. In this work, we propose an epitaxial slice damage-free process to fabricate an LED array with high density (2500 pixels per inch). To inhibit the potential electrical and optical crosstalk, the single-contact (SC) operation mode is employed. It is demonstrated that the SC-LEDs show frequency-selective luminescence characteristics. Moreover, crosstalk effect of the LEDs is significantly reduced compared to that operating in conventional DC mode. Finally, the mechanism of crosstalk suppression is revealed by finite element analysis. This work provides a promising approach for realizing high density LED array, offering valuable reference for further development in micro/nano-display technology.