Adsorption properties of N2O and NF3 on γ-Al2O3 (110) surface: A DFT study

被引:3
作者
Wu, Xiaoyu [1 ]
Wei, Gang [1 ]
Luo, Yao [1 ]
Cao, Zhengqin [1 ]
Hu, Min [1 ]
Liu, Hang [2 ]
机构
[1] Chongqing Univ Sci & Technol, Coll Elect Engn, Chongqing 401331, Peoples R China
[2] Ultrahigh Voltage Branch State Grid Chongqing Elec, Chongqing 400014, Peoples R China
关键词
SF6/N2; adsorbent; Adsorption mechanism; First principles; DFT; ELECTRON LOCALIZATION; GAMMA-ALUMINA; MOLECULES; ENERGIES; MIXTURES; SOLIDS; SF6;
D O I
10.1016/j.colsurfa.2024.133417
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
To alleviate the environmental pressure caused by SF6 emissions, SF6/N2 has been widely used in power systems as a replacement gas. In case of abnormal equipment failure, SF6/N2 will decompose and produce many kinds of toxic and harmful gases, so it is necessary to place molecular sieves to safeguard the insulation performance of the equipment. Since gamma-Al2O3 is the main component of molecular sieves, the adsorption of N2O and NF3 on the surface of gamma-Al2O3 (110) is systematically calculated in this paper using density functional theory to investigate the adsorption energy, charge transfer, density of states (DOS), electrons density difference (EDD), electron localization function (ELF) and frontier molecular orbital theory for their stable configurations. The calculated results show that although N2O adsorption on gamma-Al2O3 (110) is slightly stronger than NF3, both gases have weak interactions with gamma-Al2O3 (110) and thus may both be physisorbed. This paper deepens the basic understanding of adsorbent adsorption of SF6/N2 decomposition gases in power equipment, and provides a theoretical basis for the optimisation study of adsorbents required for equipment with SF6/N2 as the insulating medium.
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页数:9
相关论文
共 38 条
[1]   Adsorption properties of CS2 and COF2 on the SF6 adsorbent surfaces: A DFT study [J].
Bai, Yichun ;
Wei, Gang ;
Cao, Zhengqin ;
Hu, Min ;
Yi, Qilin ;
Yao, Qiang .
APPLIED SURFACE SCIENCE, 2022, 577
[2]   A SIMPLE MEASURE OF ELECTRON LOCALIZATION IN ATOMIC AND MOLECULAR-SYSTEMS [J].
BECKE, AD ;
EDGECOMBE, KE .
JOURNAL OF CHEMICAL PHYSICS, 1990, 92 (09) :5397-5403
[3]   CALCULATION OF SMALL MOLECULAR INTERACTIONS BY DIFFERENCES OF SEPARATE TOTAL ENERGIES - SOME PROCEDURES WITH REDUCED ERRORS [J].
BOYS, SF ;
BERNARDI, F .
MOLECULAR PHYSICS, 1970, 19 (04) :553-&
[4]   Electron localization in molecules and solids: The meaning of ELF [J].
Burdett, JK ;
McCormick, TA .
JOURNAL OF PHYSICAL CHEMISTRY A, 1998, 102 (31) :6366-6372
[5]   First principles methods using CASTEP [J].
Clark, SJ ;
Segall, MD ;
Pickard, CJ ;
Hasnip, PJ ;
Probert, MJ ;
Refson, K ;
Payne, MC .
ZEITSCHRIFT FUR KRISTALLOGRAPHIE, 2005, 220 (5-6) :567-570
[6]  
Coster D., 2004, J. Phys. Chem. C., V226, P54
[7]   Effect of dispersion on the adsorption of polycyclic aromatic hydrocarbons over the γ-Al2O3 (110) surface [J].
Dang, Yu ;
Liu, Yibin ;
Feng, Xiang ;
Chen, Xiaobo ;
Yang, Chaohe .
APPLIED SURFACE SCIENCE, 2019, 486 :137-143
[8]   Electron localization at metal surfaces [J].
De Santis, L ;
Resta, R .
SURFACE SCIENCE, 2000, 450 (1-2) :126-132
[9]   From molecules to solids with the DMol3 approach [J].
Delley, B .
JOURNAL OF CHEMICAL PHYSICS, 2000, 113 (18) :7756-7764
[10]   Effect of the percentage of SF6 (100%-10%-5%) on the decomposition of SF6-N2 mixtures under negative dc coronas in the presence of water vapour or oxygen [J].
Diaz, J ;
Casanovas, AM ;
Casanovas, J .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2003, 36 (13) :1558-1564