Two-Dimensional MSi2N4 Heterostructure P-Type Transistors With Sub-Thermionic Transport Performances

被引:9
|
作者
Qu, Hengze [1 ]
Zhang, Shengli [1 ]
Zeng, Haibo [1 ]
机构
[1] Nanjing Univ Sci & Technol, Key Lab Adv Display Mat & Devices, Minist Informat Technol, Coll Mat Sci & Engn, Nanjing 210094, Peoples R China
基金
国家自然科学基金重大研究计划;
关键词
2D heterostructures; MoSi2N4; p-type FETs; sub-thermionic transport; first principles calculation; NEGATIVE CAPACITANCE;
D O I
10.1109/LED.2023.3294593
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Power dissipation has become a great challenge impeding the advancement of CMOS technology, due to the Boltzmann tyranny of Fermi-Dirac electrons. Here, we present that 2D lateral MSi2N4 (M=Nb, Ta, Mo, W) metal-semiconductor heterostructures can break through the fundamental thermionic limitation, serving as sub-thermionic rectifier diodes and p-type steep-slope field-effect transistors (FETs). Specially, the rectification ratio of 2D MSi2N4 heterostructure diodes is up to 10(10) with the ideality factor reduced to 0.24. Moreover, the sub-threshold swing (SS) for 2D MSi2N4 heterostructure FETs ranges 10-30 mV/dec with on-current reaching 2100 and 1200 mu A/mu m for high-performance and low-power applications, respectively, which is much higher than that of tunneling FETs and comparable with other 2D metal-oxide-semiconductor FETs. This work demonstrated that 2D MSi2N4 family has great potential for making sub-thermionic electronic devices, and provides novel opportunities to overcome power consumption challenge of next-generation electronics based on 2D materials.
引用
收藏
页码:1492 / 1495
页数:4
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