Evaporation and wetting behavior of water on the laser-textured silicon substrate

被引:1
|
作者
Lai, Jinxin [1 ]
Chen, Guang [2 ]
Dong, Qizheng [1 ]
Lin, Qiaoli [1 ]
机构
[1] Lanzhou Univ Technol, Sch Mat Sci & Engn, Lanzhou 730050, Peoples R China
[2] Second Peoples Hosp Gansu Prov, Dept Oral & Maxillofacial Med, Lanzhou 730000, Peoples R China
关键词
Surface roughness; Textured surface; Silicon; Hydrophilic; Evaporation; CONTACT-ANGLE; MOLTEN MG; SESSILE; SURFACE; DROPLETS; MODE;
D O I
10.1016/j.expthermflusci.2024.111143
中图分类号
O414.1 [热力学];
学科分类号
摘要
It is important to elucidate the impact of surface micromorphology on the evaporation mechanism and behavior to design rational micromorphologies for enhancing/regulating evaporation. In this study, we investigated the wetting and evaporation behaviors of water droplets on monocrystalline silicon surfaces with concentric circular textures etched using a laser engraving system at varying spacing intervals. Only when the texture spacing overlapped did it exhibit a significantly increased apparent surface energy and evaporation rate. The droplet volume decreased consistently at a constant evaporation rate at different temperatures, and the process involved two stages: constant contact radius (CCR) and constant contact angle (CCA). Laser etching increases the thickness of the oxide film from 10 to 377 nm, resulting in enhanced hydrophilicity. For millimeter-sized droplets, microscopic capillary phenomena in the vicinity of the triple line dominated the evaporation behavior rather than liquid/gas interface evaporation.
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页数:8
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