Research Progress of Vertical Channel Thin Film Transistor Device

被引:3
作者
Sun, Benxiao [1 ,2 ]
Huang, Huixue [1 ,2 ]
Wen, Pan [1 ,2 ]
Xu, Meng [2 ]
Peng, Cong [2 ]
Chen, Longlong [2 ]
Li, Xifeng [2 ]
Zhang, Jianhua [2 ]
机构
[1] Shanghai Univ, Sch Microelect, Shanghai 201800, Peoples R China
[2] Shanghai Univ, Key Lab Adv Display & Syst Applicat, Minist Educ, Shanghai 200072, Peoples R China
关键词
ultra-high-resolution; flexible display; miniaturization; vertical channel; application in sensing; thin film transistor; photo lithography; GALLIUM-ZINC-OXIDE; SENSOR; TRANSPARENT; PERFORMANCE; NITROGEN; DRIVEN; PANEL;
D O I
10.3390/s23146623
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Thin film transistors (TFTs) as the core devices for displays, are widely used in various fields including ultra-high-resolution displays, flexible displays, wearable electronic skins and memory devices, especially in terms of sensors. TFTs have now started to move towards miniaturization. Similarly to MOSFETs problem, traditional planar structure TFTs have difficulty in reducing the channel's length sub-1 & mu;m under the existing photolithography technology. Vertical channel thin film transistors (V-TFTs) are proposed. It is an effective solution to overcome the miniaturization limit of traditional planar TFTs. So, we summarize the different aspects of VTFTs. Firstly, this paper introduces the structure types, key parameters, and the impact of different preparation methods in devices of V-TFTs. Secondly, an overview of the research progress of V-TFTs' active layer materials in recent years, the characteristics of V-TFTs and their application in examples has proved the enormous application potential of V-TFT in sensing. Finally, in addition to the advantages of V-TFTs, the current technical challenge and their potential solutions are put forward, and the future development trend of this new structure of V-TFTs is proposed.
引用
收藏
页数:24
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