Investigating the Properties of a New Lateral 4H-SiC Photoconductive Semiconductor Switch With a Stacked Structure

被引:1
作者
Sha, Huiru [1 ,2 ]
Xiao, Longfei [1 ,2 ]
Luan, Chongbiao [3 ]
Sun, Xun [1 ,2 ]
Qin, Yan [3 ]
Feng, Zhuoyun [1 ,2 ]
Li, Yangfan [1 ,2 ]
Jiao, Jian [1 ,2 ]
Chen, Xiufang [1 ,2 ]
Li, Hongtao [3 ]
Xu, Xiangang [1 ,2 ]
机构
[1] Shandong Univ, State Key Lab Crystal Mat, Jinan 250100, Peoples R China
[2] Shandong Univ, Inst Novel Semicond, Jinan 250100, Peoples R China
[3] China Acad Engn Phys, Inst Fluid Phys, Mianyang 621900, Peoples R China
关键词
4H silicon carbide (4H-SiC); photoconductive semiconductor switch (PCSS); gallium nitride epitaxial layer; stack structure;
D O I
10.1109/LED.2023.3312161
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work, a new lateral photoconductive semiconductor switch (PCSS) based on high purity 4H Silicon Carbide (4H-SiC) was presented composed of a stack structure with gallium nitride epitaxial layer being grown between the electrodes. Using the Sentaurus TCAD software package, different numbers, widths, and depths of the GaN epitaxial layers were simulated. From our analysis, it was found that the output current of the photoconductor switch with the stacked structure was higher under the same conditions in the case of specific stack cells. In particular, the carriers' transmission and distribution properties were changed. More specifically, a stacked structured PCSS with a width of 250 um, a depth of 1 um, and 10 stacked cells was also fabricated. A circuit with a 50Q load resistor was also used to test the performance of PCSS, and the switch was triggered by Nd:YAG 355-nm laser (18 ns full-width). From the extracted results, it was demonstrated that compared with the PCSS without the stack structure, the laser saturation energy required by the PCSS with the stack structure was reduced by 20%. When the laser energy was saturated, the on-resistance of the PCSS with stack structure was 37.3% less than that of the PCSS without stack structure when the applied bias voltage was 10 kV.
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页码:1869 / 1872
页数:4
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