Analysis of High-Temperature Effects on InAs/In0.3Al0.7As/InSb/In0.3Al0.7 As pHEMTs on Accessing RF/Analog performance: A Machine Learning Predictive Modeling

被引:0
作者
Prasad, G. Lakshmi Vara [1 ]
Kollu, Venkatagurunatham Naidu [2 ]
Sailaja, M. [3 ]
Radhakrishnan, S. [4 ]
Mohan, K. Jagan [5 ]
Reddy, A. Kishore [6 ]
Chandra, G. Rajesh [7 ]
机构
[1] Gitam Univ, Sch Technol, Dept CSE, Visakhapatnam, India
[2] Koneru Lakshmaiah Educ Fdn, Dept Artificial Intelligence & Data Sci, Vaddeswaram, Andhra Pradesh, India
[3] Prasad V Potluri Siddhartha Inst Technol, Dept CSE, Vijayawada, India
[4] KKR & KSR Inst Technol & Sci, Dept CSE AI, Guntur, Andhra Pradesh, India
[5] KKR & KSR Inst Technol & Sci, Dept CSE AI, Guntur, AP, India
[6] Andhra Engn Coll, Dept ECE, Nellorepallem SPSR, India
[7] KKR & KSR Inst Technol & Sci, Dept CSE, Guntur, India
关键词
HEMT; High temperature; Threshold voltage; Transconductance; ELECTRON-MOBILITY TRANSISTORS; LOW-POWER; GATE LENGTH; LOW-NOISE; HEMTS; ENHANCEMENT; IONIZATION; ALSB/INAS; VOLTAGE; IMPACT;
D O I
10.1007/s42341-023-00487-z
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this paper, we delve into the intriguing realm of Pseudo-morphic High Electron Mobility Transistors (pHEMTs) composed of InAs/In0.3Al0.7As/InSb/In0.3Al0.7 layers, utilizing Silvaco-TCAD for simulation. Our focus centers on the assessment of RF and analog electrical characteristics, with a keen eye on the high-temperature effects. The influence of temperature on device performance is meticulously evaluated in comparison to a reference device operating at room temperature. Traditionally, the critical parameters such as threshold voltage ( V-th ), transconductance ( g(m) ), and I-on/I-off ratio have been calculated within the temperature range spanning from 300 K to 700 K. The primary pHEMT device in our study exhibits impressive attributes, featuring a drain current of 950 mA, a threshold voltage of -1.75 V, a high transconductance ( g(m) ) value of 650 mS/mm, an I-on/I-off ratio of 1x10(6) , a transition frequency ( ft ) soaring to 790 GHz, and a maximum frequency ( f(max) ) reaching a staggering 1.4 THz. However, as we traverse the temperature spectrum, our findings unveil a compelling narrative. The impact of rising temperature is unequivocal, triggering a cascade of transformations within the device. Notably, as the temperature escalates, we observe a noticeable decrease in current, a reduction in transconductance (g(m) ), and a diminishing I-on/I-off ratio. To unravel the intricacies of these temperature-induced effects, we introduce the infusion of Machine Learning (ML) into our analysis.
引用
收藏
页码:89 / 97
页数:9
相关论文
共 48 条
[1]  
[Anonymous], 2016, Atlas Users Manual
[2]   Modeling of lattice site-dependent incomplete ionization in a-SiC devices [J].
Ayalew, T ;
Grasser, T ;
Kosina, H ;
Selberherr, S .
SILICON CARBIDE AND RELATED MATERIALS 2004, 2005, 483 :845-848
[3]  
Bakowski M, 1997, PHYS STATUS SOLIDI A, V162, P421, DOI 10.1002/1521-396X(199707)162:1<421::AID-PSSA421>3.0.CO
[4]  
2-B
[5]   An optimized Graphene/4H-SiC/Graphene MSM UV-photodetector operating in a wide range of temperature [J].
Bencherif, H. ;
Dehimi, L. ;
Messina, G. ;
Vincent, P. ;
Pezzimenti, F. ;
Della Corte, F. G. .
SENSORS AND ACTUATORS A-PHYSICAL, 2020, 307
[6]   Temperature and SiO2/4H-SiC interface trap effects on the electrical characteristics of low breakdown voltage MOSFETs [J].
Bencherif, H. ;
Dehimi, L. ;
Pezzimenti, F. ;
Della Corte, F. G. .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2019, 125 (05)
[7]   Impact ionization suppression by quantum confinement: Effects on the DC and microwave performance of narrow-gap channel InAs/AlSb HFET's [J].
Bolognesi, CR ;
Dvorak, MW ;
Chow, DH .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1999, 46 (05) :826-832
[8]   AlSb/InAs HEMT's for low-voltage, high-speed applications [J].
Boos, JB ;
Kruppa, W ;
Bennett, BR ;
Park, D ;
Kirchoefer, SW ;
Bass, R ;
Dietrich, HB .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1998, 45 (09) :1869-1875
[9]   CARRIER MOBILITIES IN SILICON EMPIRICALLY RELATED TO DOPING AND FIELD [J].
CAUGHEY, DM ;
THOMAS, RE .
PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1967, 55 (12) :2192-+
[10]   Study on high mobility In0.6Ga0.4As channel MOSHEMT and MOSFET [J].
Chang Hu-Dong ;
Sun Bing ;
Lu Li ;
Zhao Wei ;
Wang Sheng-Kai ;
Wang Wen-Xin ;
Liu Hong-Gang .
ACTA PHYSICA SINICA, 2012, 61 (21)