The influence of pulse duration and duty cycle on the energy flux to the substrate in high power impulse magnetron sputtering

被引：7

作者：

Oskirko, V. O. ^{[1
,2
]}

Zakharov, A. N. ^{[1
]}

Grenadyorov, A. S. ^{[1
]}

Pavlov, A. P. ^{[1
,2
]}

Semenov, V. A. ^{[1
]}

Rabotkin, S. V. ^{[1
]}

Kozhevnikov, V. Yu. ^{[1
]}

Solovyev, A. A. ^{[1
]}

机构：

[1] RAS, SB, Inst High Current Elect, 2-3 Akademichesky Ave, Tomsk 634055, Russia

[2] Appl Elect LLC, 97-10 Elizarov Str, Tomsk 634055, Russia

来源：

VACUUM | 2023年 / 216卷

关键词：

HiPIMS; Energy flux to the substrate; Ion current density; Calorimetric probe; TITANIUM DEPOSITION; BIAS VOLTAGE; DC MAGNETRON; PLASMA; FILM; TEMPERATURE; BOMBARDMENT; DISCHARGES; SIMULATION; TRANSPORT;

D O I：

10.1016/j.vacuum.2023.112459

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The paper focuses on measurements of the total energy flux and normalized energy flux onto the substrate during high power impulse magnetron sputtering (HiPIMS) in a wide range of the pulse duration and discharge current. Al, Cr and Ti targets with a diameter 76 mm are used for sputtering. HiPIMS parameters include 1 kW discharge power, 15 to 150 Lambda discharge current, 0.4-10 kHz pulse frequency, and 5-100 mu s pulse duration. It is shown that the use of short pulses leads to similar to 40 and 70% growth in the total energy flux onto floating and biased (-100 V) substrates, respectively. The energy per unit volume of the deposited coating increases by several times, if the pulse duration and the duty cycle are reduced. The paper examines reasons for the increased total and normalized energy fluxes onto the substrate observed after the pulse parameter modulation in the sputtering process.

引用

页数：11

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