type-II superlattice;
molecular-beam epitaxy;
reflection high-energy electron diffraction;
atomic-force microscopy;
X-ray diffraction analysis;
OPTICAL-PROPERTIES;
II SUPERLATTICE;
MBE GROWTH;
OPTIMIZATION;
INAS;
D O I:
10.3103/S1068335623090051
中图分类号:
O4 [物理学];
学科分类号:
0702 ;
摘要:
The problems of growing short-period InAs/GaSb superlattices on GaSb (100) substrates by molecular-beam epitaxy are studied. For InAs/GaSb epitaxial heterostructures, a method for forming "InSb-like" atomically smooth interfaces with an ultrathin intermediate In(As)Sb layer is developed. This technique allowed growth of a short-period superlattice containing 50 InAs/GaSb periods. In situ growth control using high-energy electron diffraction and post-growth studies of the superlattice using atomic-force microscopy and X-ray diffraction confirm the efficiency of the technique for fabricating detector structures based on type-II superlattices.