Surface Modification and Theoretical Investigation by Simulation for Light Trapping in Silicon Heterojunction Solar Cells

被引:3
作者
Park, Hyeong Gi [1 ]
Shin, Myunghun [2 ]
Kim, Yong-Ki [2 ]
Lee, Jae-Hyun [3 ,4 ]
Ju, Minkyu [5 ]
Yi, Junsin [6 ]
机构
[1] Ajou Univ, KIURI Res Ctr, Med Ctr, Suwon 16499, South Korea
[2] Korea Aerosp Univ, Sch Elect & Informat Engn, Goyang 10540, South Korea
[3] Ajou Univ, Dept Energy Syst Res, Suwon 16499, South Korea
[4] Ajou Univ, Dept Mat Sci & Engn, Suwon 16499, South Korea
[5] Hyundai Energy Solut Co Ltd, PV Cell Dev Team, Seongnam Si 27711, Chungcheongbuk, South Korea
[6] Sungkyunkwan Univ, Coll Informat & Commun Engn, Suwon 16419, South Korea
基金
新加坡国家研究基金会;
关键词
High efficiency; Heterojunction solar cell; Light trapping; Surface modification; EFFICIENCY; THIN; PASSIVATION; PERFORMANCE; CONTACT;
D O I
10.1007/s42341-023-00479-z
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The 25% conversion efficiency of silicon solar cells is attributed to monocrystalline silicon wafers. These wafers have been utilized in the development of heterojunction with intrinsic thin-layer solar cells. To harness electrical power efficiently from a solar cell, it is essential not only to enhance its performance but also to significantly reduce its production costs. It is projected that the thickness of the Si wafer will gradually approach a minimum value of approximately 100 mu m in the future. As a result, reducing the as-cut wafer thickness can lead to a more efficient utilization of silicon. In this paper, we present an approach for surface modification using a thin wafer, specifically for the application of rear-emitter silicon heterojunction (RE-SHJ) solar cells. RE-SHJ solar cells often experience a reduction in current density due to optical losses, such as the absorption in each layer and reflections on both the front and rear sides. For the application of RE-SHJ solar cells, we fabricated different pyramid sizes using a texturing solution after polishing the rear surface. The surface modifications in this study incorporated both front-side texturing and rear-side polishing. These modifications can contribute to enhanced efficiency, even with a thin wafer.
引用
收藏
页码:579 / 588
页数:10
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