Type-II Bi2O2Se/MoTe2 van der Waals Heterostructure Photodetectors with High Gate-Modulation Photovoltaic Performance

被引:46
|
作者
Dan, Zhiying [1 ,2 ]
Yang, Baoxiang [1 ]
Song, Qiqi [3 ]
Chen, Jianru [1 ]
Li, Hengyi [1 ]
Gao, Wei [1 ]
Huang, Le [3 ]
Zhang, Menglong [1 ]
Yang, Mengmeng [1 ]
Zheng, Zhaoqiang [3 ]
Huo, Nengjie [1 ]
Han, Lixiang [1 ]
Li, Jingbo [1 ]
机构
[1] South China Normal Univ, Sch Semicond Sci & Technol, Guangdong Prov Key Lab Chip & Integrat Technol, Foshan 528225, Peoples R China
[2] Univ Groningen, Zernike Inst Adv Mat, NL-9747 AG Groningen, Netherlands
[3] Guangdong Univ Technol, Sch Mat & Energy, Guangzhou 510006, Peoples R China
基金
中国国家自然科学基金;
关键词
2H-MoTe2; 2D van der Waals heterostructure photodetector; type-II band alignment; gate-modulation photovoltaic effect; BROAD-BAND PHOTODETECTION; SELF-DRIVEN; HETEROJUNCTION;
D O I
10.1021/acsami.3c01807
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In recent years, two-dimensional (2D) nonlayered Bi2O2Se-based electronics and optoelectronics have drawn enormous attention owing to their high electron mobility, facile synthetic process, stability to the atmosphere, and moderate narrow band gaps. However, 2D Bi2O2Se-based photodetectors typically present large dark current, relatively slow response speed, and persistent photoconductivity effect, limiting further improvement in fast-response imaging sensors and low-consumption broadband detection. Herein, a Bi2O2Se/2H-MoTe2 van der Waals (vdWs) heterostructure obtained from the chemical vapor deposition (CVD) approach and vertical stacking is reported. The proposed type-II staggered band alignment desirable for suppression of dark current and separation of photoinduced carriers is confirmed by density functional theory (DFT) calculations, accompanied by strong interlayer coupling and efficient built-in potential at the junction. Consequently, a stable visible (405 nm) to near-infrared (1310 nm) response capability, a self-driven prominent responsivity (R) of 1.24 A center dot W-1, and a high specific detectivity (D*) of 3.73 x 1011 Jones under 405 nm are achieved. In particular, R, D*, fill factor, and photoelectrical conversion efficiency (PCE) can be enhanced to 4.96 A center dot W-1, 3.84 x 1012 Jones, 0.52, and 7.21% at Vg = -60 V through a large band offset originated from the n+-p junction. It is suggested that the present vdWs heterostructure is a promising candidate for logical integrated circuits, image sensors, and low-power consumption detection.
引用
收藏
页码:18101 / 18113
页数:13
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