Self-Assembled Monolayers of a Fluorinated Phosphonic Acid as a Protective Coating on Aluminum
被引:1
|
作者:
Duan, Zhuoqi
论文数: 0引用数: 0
h-index: 0
机构:
Dali Univ, Coll Engn, Dali 671003, Peoples R ChinaDali Univ, Coll Engn, Dali 671003, Peoples R China
Duan, Zhuoqi
[1
]
Xie, Zaixin
论文数: 0引用数: 0
h-index: 0
机构:
Dali Univ, Coll Engn, Dali 671003, Peoples R ChinaDali Univ, Coll Engn, Dali 671003, Peoples R China
Xie, Zaixin
[1
]
Hu, Yongmao
论文数: 0引用数: 0
h-index: 0
机构:
Dali Univ, Coll Engn, Dali 671003, Peoples R ChinaDali Univ, Coll Engn, Dali 671003, Peoples R China
Hu, Yongmao
[1
]
Xu, Jiawen
论文数: 0引用数: 0
h-index: 0
机构:
Univ Western Ontario, Surface Sci Western, London, ON N6G 0J3, Canada
Jiangnan Univ, Sch Mech Engn, Wuxi 214122, Peoples R ChinaDali Univ, Coll Engn, Dali 671003, Peoples R China
Xu, Jiawen
[2
,3
]
Ren, Jun
论文数: 0引用数: 0
h-index: 0
机构:
Univ Western Ontario, Surface Sci Western, London, ON N6G 0J3, Canada
Jiangnan Univ, Sch Mech Engn, Wuxi 214122, Peoples R ChinaDali Univ, Coll Engn, Dali 671003, Peoples R China
Ren, Jun
[2
,3
]
Liu, Yu
论文数: 0引用数: 0
h-index: 0
机构:
Jiangnan Univ, Sch Mech Engn, Wuxi 214122, Peoples R ChinaDali Univ, Coll Engn, Dali 671003, Peoples R China
Liu, Yu
[3
]
Nie, Heng-Yong
论文数: 0引用数: 0
h-index: 0
机构:
Univ Western Ontario, Surface Sci Western, London, ON N6G 0J3, Canada
Univ Western Ontario, Dept Phys & Astron, London, ON N6A 3K7, CanadaDali Univ, Coll Engn, Dali 671003, Peoples R China
Nie, Heng-Yong
[2
,4
]
机构:
[1] Dali Univ, Coll Engn, Dali 671003, Peoples R China
[2] Univ Western Ontario, Surface Sci Western, London, ON N6G 0J3, Canada
[3] Jiangnan Univ, Sch Mech Engn, Wuxi 214122, Peoples R China
[4] Univ Western Ontario, Dept Phys & Astron, London, ON N6A 3K7, Canada
来源:
MOLECULES
|
2024年
/
29卷
/
03期
基金:
中国国家自然科学基金;
关键词:
self-assembled monolayers (SAMs);
fluorinated phosphonic acid (FPA);
native oxide layer of aluminum;
covalent bonding;
surface roughening;
hot water (HW) treatment;
time-of-flight secondary ion mass spectrometry (ToF-SIMS);
water contact angle (CA);
surface and interface chemistry;
surface morphology;
ION MASS-SPECTROMETRY;
LANGMUIR-BLODGETT;
TOF-SIMS;
SURFACES;
OXIDE;
TRANSITION;
ADSORPTION;
KINETICS;
BINDING;
WENZEL;
D O I:
10.3390/molecules29030706
中图分类号:
Q5 [生物化学];
Q7 [分子生物学];
学科分类号:
071010 ;
081704 ;
摘要:
Aluminum (Al) placed in hot water (HW) at 90 degrees C is roughened due to its reaction with water, forming Al hydroxide and Al oxide, as well as releasing hydrogen gas. The roughened surface is thus hydrophilic and possesses a hugely increased surface area, which can be useful in applications requiring hydrophilicity and increased surface area, such as atmospheric moisture harvesting. On the other hand, when using HW to roughen specified areas of an Al substrate, ways to protect the other areas from HW attacks are necessary. We demonstrated that self-assembled monolayers (SAMs) of a fluorinated phosphonic acid (FPA, CF3(CF2)13(CH2)2P(=O)(OH)2) derivatized on the native oxide of an Al film protected the underneath metal substrate from HW attack. The intact wettability and surface morphology of FPA-derivatized Al subjected to HW treatment were examined using contact angle measurement, and scanning electron microscopy and atomic force microscopy, respectively. Moreover, the surface and interface chemistry of FPA-derivatized Al before and after HW treatment were investigated by time-of-flight secondary ion mass spectrometry (ToF-SIMS), verifying that the FPA SAMs were intact upon HW treatment. The ToF-SIMS results therefore explained, on the molecular level, why HW treatment did not affect the underneath Al at all. FPA derivatization is thus expected to be developed as a patterning method for the formation of hydrophilic and hydrophobic areas on Al when combined with HW treatment.
机构:
Univ Rochester, Dept Chem, Rochester, NY 14627 USAUniv Rochester, Dept Chem, Rochester, NY 14627 USA
Angel, Felipe A.
Lyubarskaya, Yekaterina L.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Rochester, Dept Chem, Rochester, NY 14627 USAUniv Rochester, Dept Chem, Rochester, NY 14627 USA
Lyubarskaya, Yekaterina L.
Shestopalov, Alexander A.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Rochester, Dept Chem Engn, Rochester, NY 14627 USAUniv Rochester, Dept Chem, Rochester, NY 14627 USA
Shestopalov, Alexander A.
Tang, Ching W.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Rochester, Dept Chem, Rochester, NY 14627 USA
Univ Rochester, Dept Chem Engn, Rochester, NY 14627 USAUniv Rochester, Dept Chem, Rochester, NY 14627 USA
机构:
Univ Tokyo, Grad Sch Engn, Dept Appl Chem, Tokyo 1138656, Japan
Kyushu Univ, Inst Mat Chem & Engn, Fukuoka 8168580, JapanUniv Tokyo, Grad Sch Engn, Dept Appl Chem, Tokyo 1138656, Japan
Nakamura, Kentaro
Takahashi, Tsunaki
论文数: 0引用数: 0
h-index: 0
机构:
Univ Tokyo, Grad Sch Engn, Dept Appl Chem, Tokyo 1138656, Japan
PRESTO, JST, Kawaguchi, Saitama 3320012, JapanUniv Tokyo, Grad Sch Engn, Dept Appl Chem, Tokyo 1138656, Japan
Takahashi, Tsunaki
Hosomi, Takuro
论文数: 0引用数: 0
h-index: 0
机构:
Univ Tokyo, Grad Sch Engn, Dept Appl Chem, Tokyo 1138656, Japan
PRESTO, JST, Kawaguchi, Saitama 3320012, JapanUniv Tokyo, Grad Sch Engn, Dept Appl Chem, Tokyo 1138656, Japan
Hosomi, Takuro
Yamaguchi, Yu
论文数: 0引用数: 0
h-index: 0
机构:
Univ Tokyo, Grad Sch Engn, Dept Appl Chem, Tokyo 1138656, JapanUniv Tokyo, Grad Sch Engn, Dept Appl Chem, Tokyo 1138656, Japan
Yamaguchi, Yu
Tanaka, Wataru
论文数: 0引用数: 0
h-index: 0
机构:
Univ Tokyo, Grad Sch Engn, Dept Appl Chem, Tokyo 1138656, JapanUniv Tokyo, Grad Sch Engn, Dept Appl Chem, Tokyo 1138656, Japan
Tanaka, Wataru
Liu, Jiangyang
论文数: 0引用数: 0
h-index: 0
机构:
Univ Tokyo, Grad Sch Engn, Dept Appl Chem, Tokyo 1138656, JapanUniv Tokyo, Grad Sch Engn, Dept Appl Chem, Tokyo 1138656, Japan
Liu, Jiangyang
Kanai, Masaki
论文数: 0引用数: 0
h-index: 0
机构:
Kyushu Univ, Inst Mat Chem & Engn, Fukuoka 8168580, JapanUniv Tokyo, Grad Sch Engn, Dept Appl Chem, Tokyo 1138656, Japan
Kanai, Masaki
Nagashima, Kazuki
论文数: 0引用数: 0
h-index: 0
机构:
Univ Tokyo, Grad Sch Engn, Dept Appl Chem, Tokyo 1138656, Japan
PRESTO, JST, Kawaguchi, Saitama 3320012, JapanUniv Tokyo, Grad Sch Engn, Dept Appl Chem, Tokyo 1138656, Japan
Nagashima, Kazuki
Yanagida, Takeshi
论文数: 0引用数: 0
h-index: 0
机构:
Univ Tokyo, Grad Sch Engn, Dept Appl Chem, Tokyo 1138656, Japan
Kyushu Univ, Inst Mat Chem & Engn, Fukuoka 8168580, JapanUniv Tokyo, Grad Sch Engn, Dept Appl Chem, Tokyo 1138656, Japan