Self-Assembled Monolayers of a Fluorinated Phosphonic Acid as a Protective Coating on Aluminum
被引:1
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作者:
Duan, Zhuoqi
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h-index: 0
机构:
Dali Univ, Coll Engn, Dali 671003, Peoples R ChinaDali Univ, Coll Engn, Dali 671003, Peoples R China
Duan, Zhuoqi
[1
]
Xie, Zaixin
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h-index: 0
机构:
Dali Univ, Coll Engn, Dali 671003, Peoples R ChinaDali Univ, Coll Engn, Dali 671003, Peoples R China
Xie, Zaixin
[1
]
Hu, Yongmao
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机构:
Dali Univ, Coll Engn, Dali 671003, Peoples R ChinaDali Univ, Coll Engn, Dali 671003, Peoples R China
Hu, Yongmao
[1
]
Xu, Jiawen
论文数: 0引用数: 0
h-index: 0
机构:
Univ Western Ontario, Surface Sci Western, London, ON N6G 0J3, Canada
Jiangnan Univ, Sch Mech Engn, Wuxi 214122, Peoples R ChinaDali Univ, Coll Engn, Dali 671003, Peoples R China
Xu, Jiawen
[2
,3
]
Ren, Jun
论文数: 0引用数: 0
h-index: 0
机构:
Univ Western Ontario, Surface Sci Western, London, ON N6G 0J3, Canada
Jiangnan Univ, Sch Mech Engn, Wuxi 214122, Peoples R ChinaDali Univ, Coll Engn, Dali 671003, Peoples R China
Ren, Jun
[2
,3
]
Liu, Yu
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机构:
Jiangnan Univ, Sch Mech Engn, Wuxi 214122, Peoples R ChinaDali Univ, Coll Engn, Dali 671003, Peoples R China
Liu, Yu
[3
]
Nie, Heng-Yong
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机构:
Univ Western Ontario, Surface Sci Western, London, ON N6G 0J3, Canada
Univ Western Ontario, Dept Phys & Astron, London, ON N6A 3K7, CanadaDali Univ, Coll Engn, Dali 671003, Peoples R China
Nie, Heng-Yong
[2
,4
]
机构:
[1] Dali Univ, Coll Engn, Dali 671003, Peoples R China
[2] Univ Western Ontario, Surface Sci Western, London, ON N6G 0J3, Canada
[3] Jiangnan Univ, Sch Mech Engn, Wuxi 214122, Peoples R China
[4] Univ Western Ontario, Dept Phys & Astron, London, ON N6A 3K7, Canada
来源:
MOLECULES
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2024年
/
29卷
/
03期
基金:
中国国家自然科学基金;
关键词:
self-assembled monolayers (SAMs);
fluorinated phosphonic acid (FPA);
native oxide layer of aluminum;
covalent bonding;
surface roughening;
hot water (HW) treatment;
time-of-flight secondary ion mass spectrometry (ToF-SIMS);
water contact angle (CA);
surface and interface chemistry;
surface morphology;
ION MASS-SPECTROMETRY;
LANGMUIR-BLODGETT;
TOF-SIMS;
SURFACES;
OXIDE;
TRANSITION;
ADSORPTION;
KINETICS;
BINDING;
WENZEL;
D O I:
10.3390/molecules29030706
中图分类号:
Q5 [生物化学];
Q7 [分子生物学];
学科分类号:
071010 ;
081704 ;
摘要:
Aluminum (Al) placed in hot water (HW) at 90 degrees C is roughened due to its reaction with water, forming Al hydroxide and Al oxide, as well as releasing hydrogen gas. The roughened surface is thus hydrophilic and possesses a hugely increased surface area, which can be useful in applications requiring hydrophilicity and increased surface area, such as atmospheric moisture harvesting. On the other hand, when using HW to roughen specified areas of an Al substrate, ways to protect the other areas from HW attacks are necessary. We demonstrated that self-assembled monolayers (SAMs) of a fluorinated phosphonic acid (FPA, CF3(CF2)13(CH2)2P(=O)(OH)2) derivatized on the native oxide of an Al film protected the underneath metal substrate from HW attack. The intact wettability and surface morphology of FPA-derivatized Al subjected to HW treatment were examined using contact angle measurement, and scanning electron microscopy and atomic force microscopy, respectively. Moreover, the surface and interface chemistry of FPA-derivatized Al before and after HW treatment were investigated by time-of-flight secondary ion mass spectrometry (ToF-SIMS), verifying that the FPA SAMs were intact upon HW treatment. The ToF-SIMS results therefore explained, on the molecular level, why HW treatment did not affect the underneath Al at all. FPA derivatization is thus expected to be developed as a patterning method for the formation of hydrophilic and hydrophobic areas on Al when combined with HW treatment.
机构:
Heidelberg Univ, Angew Phys Chem, Neuenheimer Feld 253, D-69120 Heidelberg, GermanyMerck KGaA, Performance Mat Early Res & Business Dev, Frankfurter Str 250, D-64293 Darmstadt, Germany
Wan, Xianglong
Lieberman, Itai
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机构:
Merck KGaA, Performance Mat Early Res & Business Dev, Frankfurter Str 250, D-64293 Darmstadt, GermanyMerck KGaA, Performance Mat Early Res & Business Dev, Frankfurter Str 250, D-64293 Darmstadt, Germany
Lieberman, Itai
Asyuda, Andika
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h-index: 0
机构:
Heidelberg Univ, Angew Phys Chem, Neuenheimer Feld 253, D-69120 Heidelberg, GermanyMerck KGaA, Performance Mat Early Res & Business Dev, Frankfurter Str 250, D-64293 Darmstadt, Germany
Asyuda, Andika
Resch, Sebastian
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机构:
Merck KGaA, Performance Mat Early Res & Business Dev, Frankfurter Str 250, D-64293 Darmstadt, GermanyMerck KGaA, Performance Mat Early Res & Business Dev, Frankfurter Str 250, D-64293 Darmstadt, Germany
Resch, Sebastian
Seim, Henning
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机构:
Merck KGaA, Performance Mat Early Res & Business Dev, Frankfurter Str 250, D-64293 Darmstadt, GermanyMerck KGaA, Performance Mat Early Res & Business Dev, Frankfurter Str 250, D-64293 Darmstadt, Germany
Seim, Henning
Kirsch, Peer
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机构:
Merck KGaA, Performance Mat Early Res & Business Dev, Frankfurter Str 250, D-64293 Darmstadt, Germany
Univ Freiburg, Inst Inorgan & Analyt Chem, Albertstr 21, D-79104 Freiburg, GermanyMerck KGaA, Performance Mat Early Res & Business Dev, Frankfurter Str 250, D-64293 Darmstadt, Germany
Kirsch, Peer
Zharnikov, Michael
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机构:
Heidelberg Univ, Angew Phys Chem, Neuenheimer Feld 253, D-69120 Heidelberg, GermanyMerck KGaA, Performance Mat Early Res & Business Dev, Frankfurter Str 250, D-64293 Darmstadt, Germany