Spin-orbit torque magnetic tunnel junction based on 2-D materials: Impact of bias-layer on device performance

被引:0
作者
Shashidhara, M. [1 ,2 ]
Srivastava, Shobhit [1 ]
Panwar, Sourabh [1 ]
Acharya, Abhishek [1 ]
机构
[1] Sardar Vallabhbhai Natl Inst Technol, Dept Elect Engn, Surat, India
[2] PES Univ, Dept Elect & Commun, Bengaluru, India
关键词
MRAM; MTJ; 2D-materials; SOT; STT; DMI;
D O I
10.1016/j.sse.2023.108757
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Two-dimensional (2D) material-based Spin-orbit torque (SOT) Magnetic tunnel junction (MTJ) has drawn a lot of research interest due to its potential for low power logic and memory applications. In this study, we employed a Bias-layer (BL) on top of the Topological insulator (TI) based SOT-MTJ structure to achieve field-free deter-ministic switching. A systematic micromagnetic simulation is carried out to examine the impact of variations in the BL-width (BW) and BL-distance (BLD) from the Free-layer (FL) on the performance parameters of the device. The stray field produced by the BL has a non-uniform profile; it declines with increase in BLD from the FL and improves with as BW increases. We demonstrate that by engineering the BLD and BW, the critical current density reduces to 3.9 x 109 A/m2, switching speed improves by 0.14 ns and power dissipation density reduces to 6.98 x 1014 Watt/m3as compared to the conventional SOT-MTJ with an external magnetic field of 100 mH.
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页数:4
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