Topological flat bands in rhombohedral tetralayer and multilayer graphene on hexagonal boron nitride moire superlattices
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作者:
Park, Youngju
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Univ Seoul, Dept Phys, Seoul 02504, South KoreaUniv Seoul, Dept Phys, Seoul 02504, South Korea
Park, Youngju
[1
]
Kim, Yeonju
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Univ Seoul, Dept Phys, Seoul 02504, South KoreaUniv Seoul, Dept Phys, Seoul 02504, South Korea
Kim, Yeonju
[1
]
Chittari, Bheema Lingam
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Indian Inst Sci Educ & Res Kolkata, Dept Phys Sci, Mohanpur 741246, West Bengal, IndiaUniv Seoul, Dept Phys, Seoul 02504, South Korea
Chittari, Bheema Lingam
[2
]
Jung, Jeil
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Univ Seoul, Dept Phys, Seoul 02504, South Korea
Univ Seoul, Dept Smart Cities, Seoul 02504, South KoreaUniv Seoul, Dept Phys, Seoul 02504, South Korea
Jung, Jeil
[1
,3
]
机构:
[1] Univ Seoul, Dept Phys, Seoul 02504, South Korea
[2] Indian Inst Sci Educ & Res Kolkata, Dept Phys Sci, Mohanpur 741246, West Bengal, India
[3] Univ Seoul, Dept Smart Cities, Seoul 02504, South Korea
We show that rhombohedral four-layer graphene (4LG) nearly aligned with a hexagonal boron nitride (hBN) substrate often develops nearly flat isolated low-energy bands with nonzero valley Chern numbers. The bandwidths of the isolated flat bands are controllable through an electric field and twist angle, becoming as narrow as similar to 10 meV for interlayer potential differences between top and bottom layers of |Delta| approximate to 10-15 meV and theta similar to 0.5 degrees at the graphene and boron nitride interface. The local density of states analysis shows that the nearly flat band states are associated to the nondimer low-energy sublattice sites at the top or bottom graphene layers and their degree of localization in the moire superlattice is strongly gate tunable, exhibiting at times large delocalization despite the narrow bandwidth. We verified that the first valence band's valley Chern numbers C-V1(nu= +/- n) = +/- n, proportional to layer number for nLG/BN systems up to n = 8 rhombohedral multilayers.
机构:
Rutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08854 USA
Univ Chinese Acad Sci, Sch Phys Sci, Beijing, Peoples R China
Univ Chinese Acad Sci, CAS Ctr Excellence Topol Quantum Computat, Beijing, Peoples R ChinaRutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08854 USA
Mao, Jinhai
Milovanovic, Slavisa P.
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Univ Antwerp, Dept Fys, Antwerp, BelgiumRutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08854 USA
Milovanovic, Slavisa P.
Andelkovic, Misa
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Univ Antwerp, Dept Fys, Antwerp, BelgiumRutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08854 USA
Andelkovic, Misa
Lai, Xinyuan
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Rutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08854 USARutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08854 USA
Lai, Xinyuan
Cao, Yang
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Univ Manchester, Sch Phys & Astron, Manchester, Lancs, EnglandRutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08854 USA
Cao, Yang
Watanabe, Kenji
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Natl Inst Mat Sci, Adv Mat Lab, Tsukuba, Ibaraki, JapanRutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08854 USA
Watanabe, Kenji
Taniguchi, Takashi
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Natl Inst Mat Sci, Adv Mat Lab, Tsukuba, Ibaraki, JapanRutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08854 USA
Taniguchi, Takashi
Covaci, Lucian
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Univ Antwerp, Dept Fys, Antwerp, BelgiumRutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08854 USA
Covaci, Lucian
Peeters, Francois M.
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Univ Antwerp, Dept Fys, Antwerp, BelgiumRutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08854 USA
Peeters, Francois M.
Geim, Andre K.
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Univ Manchester, Sch Phys & Astron, Manchester, Lancs, EnglandRutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08854 USA
Geim, Andre K.
Jiang, Yuhang
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Rutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08854 USA
Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Ctr Mat Sci & Optoelect Engn, Beijing, Peoples R ChinaRutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08854 USA
Jiang, Yuhang
Andrei, Eva Y.
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Rutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08854 USARutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08854 USA
机构:
Xiangtan Univ, Sch Phys & Optoelect, Hunan Key Lab Micronano Energy Mat & Devices, Xiangtan 411105, Peoples R ChinaXiangtan Univ, Sch Phys & Optoelect, Hunan Key Lab Micronano Energy Mat & Devices, Xiangtan 411105, Peoples R China
Liu, Jingran
Luo, Chaobo
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Xiangtan Univ, Sch Phys & Optoelect, Hunan Key Lab Micronano Energy Mat & Devices, Xiangtan 411105, Peoples R ChinaXiangtan Univ, Sch Phys & Optoelect, Hunan Key Lab Micronano Energy Mat & Devices, Xiangtan 411105, Peoples R China
Luo, Chaobo
Lu, Haolin
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Nankai Univ, Renewable Energy Convers & Storage Ctr RECAST, Sch Mat Sci & Engn, Natl Inst Adv Mat, Tianjin 300350, Peoples R ChinaXiangtan Univ, Sch Phys & Optoelect, Hunan Key Lab Micronano Energy Mat & Devices, Xiangtan 411105, Peoples R China
Lu, Haolin
Huang, Zhongkai
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Yangtze Normal Univ, Key Lab Extraordinary Bond Engn & Adv Mat Technol, Chongqing 408100, Peoples R ChinaXiangtan Univ, Sch Phys & Optoelect, Hunan Key Lab Micronano Energy Mat & Devices, Xiangtan 411105, Peoples R China
Huang, Zhongkai
Long, Guankui
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Nankai Univ, Renewable Energy Convers & Storage Ctr RECAST, Sch Mat Sci & Engn, Natl Inst Adv Mat, Tianjin 300350, Peoples R ChinaXiangtan Univ, Sch Phys & Optoelect, Hunan Key Lab Micronano Energy Mat & Devices, Xiangtan 411105, Peoples R China
Long, Guankui
Peng, Xiangyang
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Xiangtan Univ, Sch Phys & Optoelect, Hunan Key Lab Micronano Energy Mat & Devices, Xiangtan 411105, Peoples R ChinaXiangtan Univ, Sch Phys & Optoelect, Hunan Key Lab Micronano Energy Mat & Devices, Xiangtan 411105, Peoples R China
机构:
Coll William & Mary, Dept Phys, Williamsburg, VA 23187 USAColl William & Mary, Dept Phys, Williamsburg, VA 23187 USA
Gani, Yohanes S.
Abergel, D. S. L.
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机构:
KTH Royal Inst Technol, Nordita, Roslagstullsbacken 23, S-10691 Stockholm, Sweden
Stockholm Univ, Roslagstullsbacken 23, S-10691 Stockholm, Sweden
Nat Phys, 4 Crinan St, London N1 9XW, EnglandColl William & Mary, Dept Phys, Williamsburg, VA 23187 USA
Abergel, D. S. L.
Rossi, Enrico
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Coll William & Mary, Dept Phys, Williamsburg, VA 23187 USAColl William & Mary, Dept Phys, Williamsburg, VA 23187 USA
机构:
Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Chen Ling-Xiu
Wang Hui-Shan
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Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100049, Peoples R ChinaChinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Wang Hui-Shan
Jiang Cheng-Xin
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Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Shanghai Tech Univ, Sch Phys Sci & Technol, Shanghai 200031, Peoples R ChinaChinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Jiang Cheng-Xin
Chen Chen
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Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100049, Peoples R ChinaChinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Chen Chen
Wang Hao-Min
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Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100049, Peoples R ChinaChinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China