Effects of GaN cap layer thickness on photoexcited carrier density in green luminescent InGaN multiple quantum wells

被引:2
|
作者
Murotani, Hideaki [1 ,2 ]
Nakatsuru, Keigo [1 ]
Kurai, Satoshi [1 ]
Okada, Narihito [1 ]
Yano, Yoshiki [3 ]
Koseki, Shuichi [3 ]
Piao, Guanxi [3 ]
Yamada, Yoichi [1 ]
机构
[1] Yamaguchi Univ, Dept Elect & Elect Engn, Ube, Yamaguchi 7558611, Japan
[2] Tokuyama Coll, Natl Inst Technol, Dept Comp Sci & Elect Engn, Shunan, Yamaguchi 7458585, Japan
[3] Taiyo Nippon Sanso Corp, Tsukuba, Ibaraki 3002611, Japan
关键词
photoluminescence; MQW; InGaN; GaN cap layer; PIEZOELECTRIC FIELDS; GROWTH TEMPERATURE;
D O I
10.35848/1347-4065/acc4fd
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effects of GaN cap layers on the optical properties of green luminescent InGaN-based multiple quantum wells were studied by photoluminescence (PL) spectroscopy. The PL peak energy under the selective excitation of the InGaN well layers was lower than that under the band-to-band excitation of the GaN barrier layers. The difference in the PL peak energies between the selective and band-to-band excitations decreased as the cap layer thickness increased, indicating an increase in the nonradiative recombination of photogenerated carriers in the barrier layers. Moreover, the internal quantum efficiency under selective excitation decreased as the cap layer thickness increased because of the increase in the internal electric field strength.
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页数:6
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