Strong-field-induced N2+ lasing by phase control of free induction decay

被引:4
|
作者
Wang, Siqi [1 ]
Fu, Yao [1 ]
Lotstedt, Erik [2 ]
Cao, Jincheng [1 ]
Zang, Hongwei [1 ]
Li, Helong [1 ,3 ]
Yamanouchi, Kaoru [2 ]
Xu, Huailiang [1 ]
机构
[1] Jilin Univ, Coll Elect Sci & Engn, State Key Lab Integrated Optoelect, Changchun 130012, Peoples R China
[2] Univ Tokyo, Sch Sci, Dept Chem, 7-3-1 Hongo,Bunkyo Ku, Tokyo 1130033, Japan
[3] Jilin Univ, Inst Atom & Mol Phys, Changchun 130012, Peoples R China
基金
中国国家自然科学基金;
关键词
LASER; FILAMENTS;
D O I
10.1103/PhysRevA.108.033113
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We prepare N-2(+) mostly in the vibrational ground X-2 Sigma(+)(g) state by an ultraviolet 267-nm pulse and create the free induction decay (FID) of the B-2 Sigma(+)(u) - X-2 Sigma(+)(g)(0, 0) transition at 391 nm by a resonant excitation pulse. By controlling the phase shift of the FID using a near-IR control pulse through the dynamical Stark effect and rotational coherence, we reveal that the absorption spectrum of this transition, exhibiting a Lorentzian absorption profile, can be changed into a Fano-type profile, and then, a Lorentzian emission profile, resulting in N-2(+) lasing. Our results shed light on the long-term controversy over the mechanism of strong-field-induced N-2(+) lasing and reveal a general route to achieving amplification of light resonantly interacting with molecular ions without population inversion.
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页数:7
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