Aggregation of the polydopamine (PDA) molecular buildingblocksat the air/water interface leads to obtaining large surface nanometric-thinfilms. This mechanism follows two possible pathways, namely, covalentor non-covalent self-assembly, which result in a different degreeof structure order and, consequently, different structural properties.Control of this mechanism could be vital for applications that requiretrue self-support PDA free-standing films, for example, electrochemicalsensing or membrane technology. Here, we are considering the impactof boric acid (BA) and Cu2+ ions on the mentioned mechanismexclusively for the free-standing films from the air/water interface.We have employed and refined our own spectroscopic reflectometry methodto achieve an exceptionally high real-time control over the thicknessgrowth. It turned out that BA and Cu2+ ions significantlyimpact the film growth process. Reduction of the nanoparticles sizeand their number was examined via UV-vis spectroscopy and transmissionelectron microscopy, showing a colossal reduction in the mean diameterof nanoparticles in the case of BA and a moderate reduction in thecase of Cu2+. This modification is leading to significantenhancement of the process efficiency through moderation of the topologicalproperties of the films, as revealed by atomic force microscopy. Next,applying infrared, Raman, and X-ray photoelectron spectroscopy, wepresented small amounts of metal (B or Cu) in the final structureof PDA and simultaneously their vital role in the oxidation mechanismand cross-linking through covalent or non-covalent bonds. Therefore,we revealed the possibility of synthesizing films via the expectedself-assembly mechanism which has hitherto been out of control. Moreover,modification of mechanical properties toward exceptionally elasticfilms through the BA-assisted synthesis pathway was shown by achievingYoung's modulus value up to 24.1 & PLUSMN; 5.6 and 18.3 & PLUSMN;6.4 GPa, using nanoindentation and Brillouin light scattering, respectively.
机构:
Hunan Univ, Coll Mat Sci & Engn, Changsha 410082, Hunan, Peoples R China
Alfred Univ, Kazuo Inamori Sch Engn, New York State Coll Ceram, Alfred, NY 14802 USAHunan Univ, Coll Mat Sci & Engn, Changsha 410082, Hunan, Peoples R China
Gao, Peng
Gong, Yuxuan
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Alfred Univ, Kazuo Inamori Sch Engn, New York State Coll Ceram, Alfred, NY 14802 USA
Owens Corning Sci & Technol Ctr, Granville, OH 43023 USAHunan Univ, Coll Mat Sci & Engn, Changsha 410082, Hunan, Peoples R China
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Univ Oxford, Weatherall Inst Mol Med, MRC Human Immunol Unit, Oxford OX3 9DS, England
Friedrich Schiller Univ Jena, Inst Appl Opt, Max Wien Pl 4, D-07743 Jena, Germany
Leibniz Inst Photon Technol eV, Albert Einstein Str 9, D-07745 Jena, GermanyUniv Oxford, Weatherall Inst Mol Med, MRC Human Immunol Unit, Oxford OX3 9DS, England
Eggeling, Christian
Sezgin, Erdinc
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Univ Oxford, Weatherall Inst Mol Med, MRC Human Immunol Unit, Oxford OX3 9DS, EnglandUniv Oxford, Weatherall Inst Mol Med, MRC Human Immunol Unit, Oxford OX3 9DS, England
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INSERM, Unite Mixte Rech 1121, 11 Rue Humann, F-67085 Strasbourg, FranceINSERM, Unite Mixte Rech 1121, 11 Rue Humann, F-67085 Strasbourg, France
Ponzio, Florian
Le Houerou, Vincent
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Univ Strasbourg, Inst Charles Sadron, CNRS, Unite Propre 22, 23 Rue Loess, F-67034 Strasbourg 2, FranceINSERM, Unite Mixte Rech 1121, 11 Rue Humann, F-67085 Strasbourg, France
Le Houerou, Vincent
Zafeiratos, Spyridon
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Univ Strasbourg, ICPEES, ECPM, 25 Rue Becquerel, F-67087 Strasbourg 2, FranceINSERM, Unite Mixte Rech 1121, 11 Rue Humann, F-67085 Strasbourg, France
Zafeiratos, Spyridon
Gauthier, Christian
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Univ Strasbourg, Inst Charles Sadron, CNRS, Unite Propre 22, 23 Rue Loess, F-67034 Strasbourg 2, FranceINSERM, Unite Mixte Rech 1121, 11 Rue Humann, F-67085 Strasbourg, France
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Stoletovs Vladimir State Univ, Dept Phys & Appl Math, Vladimir, RussiaStoletovs Vladimir State Univ, Dept Phys & Appl Math, Vladimir, Russia
Samyshkin, Vlad
Lelekova, Anastasia
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Stoletovs Vladimir State Univ, Dept Phys & Appl Math, Vladimir, RussiaStoletovs Vladimir State Univ, Dept Phys & Appl Math, Vladimir, Russia
Lelekova, Anastasia
Osipov, Anton
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Stoletovs Vladimir State Univ, Dept Phys & Appl Math, Vladimir, Russia
ILIT RAS Branch FSRC Crystallog & Photon RAS, Moscow, Moscow Region, RussiaStoletovs Vladimir State Univ, Dept Phys & Appl Math, Vladimir, Russia
Osipov, Anton
Bukharov, Dmitrii
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Stoletovs Vladimir State Univ, Dept Phys & Appl Math, Vladimir, RussiaStoletovs Vladimir State Univ, Dept Phys & Appl Math, Vladimir, Russia
Bukharov, Dmitrii
Skryabin, Igor
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Stoletovs Vladimir State Univ, Dept Phys & Appl Math, Vladimir, RussiaStoletovs Vladimir State Univ, Dept Phys & Appl Math, Vladimir, Russia
Skryabin, Igor
Arakelian, Sergey
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Stoletovs Vladimir State Univ, Dept Phys & Appl Math, Vladimir, RussiaStoletovs Vladimir State Univ, Dept Phys & Appl Math, Vladimir, Russia
Arakelian, Sergey
Kucherik, Alexey
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Stoletovs Vladimir State Univ, Dept Phys & Appl Math, Vladimir, RussiaStoletovs Vladimir State Univ, Dept Phys & Appl Math, Vladimir, Russia
Kucherik, Alexey
Kutrovskaya, Stella
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Stoletovs Vladimir State Univ, Dept Phys & Appl Math, Vladimir, Russia
Westlake Univ, Sch Sci, Hangzhou, Zhejiang, Peoples R China
Westlake Inst Adv Study, Inst Nat Sci, Hangzhou, Zhejiang, Peoples R ChinaStoletovs Vladimir State Univ, Dept Phys & Appl Math, Vladimir, Russia