Output breakdown characteristics of amorphous InGaZnO thin-film transistors at high gate voltage

被引:1
作者
Yang, Huan [1 ]
Huang, Tengyan [1 ]
Pan, Wengao [1 ]
Lu, Lei [1 ]
Zhang, Shengdong [1 ,2 ]
机构
[1] Peking Univ, Sch Elect & Comp Engn, Shenzhen 518055, Peoples R China
[2] Peking Univ, Sch Integrated Circuits, Beijing 100871, Peoples R China
关键词
DEGRADATION; TEMPERATURE;
D O I
10.1063/5.0188427
中图分类号
O59 [应用物理学];
学科分类号
摘要
Output characteristics of top-gate amorphous InGaZnO thin-film transistors are investigated at high gate voltage. With the increasing drain voltage, an output breakdown crops up closely following a drastic uprush of drain current. Such dramatically elevated drain current derives from the self-heating (SH) effect-generated channel donors. Measured at different high gate voltages, the output breakdown occurs in either linear or saturation regime, respectively, corresponding to normally-on and normally-off transfer curve, while the SH-triggering powers are almost identical. The conductor-like channel originates from the SH-induced high donor population, while the disconnection between channel and drain is caused by a highly defective region near drain, where the hot-carrier damage is violently activated by the SH-induced high temperature and the high drain electric field in saturation regime.
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页数:4
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