The Extended Method of Lines for the Characterization of Dielectric Metasurfaces for Ultraviolet Chiral Sensing

In this study, the semianalytical method of lines (MoLs) is extended to characterize the chiroptical behavior of a multilayered dielectric metasurface at the ultraviolet (UV) regime, where the majority of chiral samples exhibit their dichroic absorption features. The proposed reflection coefficient transformation approach provides the reflection and transmission coefficients at each plane of the multilayered structure. Additionally, a method for obtaining optical chirality ( C) augmentation in the nanophotonic system when illuminated with circularly polarized light is put forward. Two novel dielectric metasurfaces with the ability to generate accessible superchiral near-field hot spots have been designed and examined using the proposed method as proof of concept. The electric and magnetic dipole modes are forced to overlap spatially and spectrally, enabling uniform sign amplification in C that is locally as high as 212-fold and 226-fold in hot spot cites, respectively.