Chiral anomaly and Weyl orbit in three-dimensional Dirac semimetal Cd3As2 grown on Si

被引:3
作者
Lin, Wei-Chen [1 ,2 ]
Tsai, Peng-Ying [3 ]
Zou, Jia-Zhu [4 ]
Lee, Jie-Ying [4 ]
Kuo, Chun-Wei [5 ]
Lee, Hsin-Hsuan [6 ]
Pan, Ching-Yang [7 ]
Yang, Cheng-Hsueh [3 ]
Chen, Sheng-Zong [4 ]
Wang, Jyh-Shyang [6 ,8 ]
Jiang, Pei-hsun [7 ]
Liang, Chi-Te [3 ,4 ]
Chuang, Chiashain [5 ,8 ]
机构
[1] Acad Sinica, Taiwan Int Grad Program, Taipei 115, Taiwan
[2] Natl Tsing Hua Univ, Dept Engn & Syst Sci, Hsinchu 300, Taiwan
[3] Natl Taiwan Univ, Grad Inst Appl Phys, Taipei 106, Taiwan
[4] Natl Taiwan Univ, Taipei 106, Taiwan
[5] Chung Yuan Christian Univ, Dept Elect Engn, Taoyuan 320, Taiwan
[6] Chung Yuan Christian Univ, Dept Phys, Taoyuan 320, Taiwan
[7] Natl Taiwan Normal Univ, Dept Phys, Taipei 106, Taiwan
[8] Chung Yuan Christian Univ, Res Ctr Semicond Mat & Adv Opt, Taoyuan 320, Taiwan
关键词
Cd3As2; chiral anomaly; weak antilocalization; Si CMOS; BERRYS PHASE; MAGNETORESISTANCE; MOBILITY;
D O I
10.1088/1361-6528/ad1941
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Preparing Cd3As2, which is a three-dimensional (3D) Dirac semimetal in certain crystal orientation, on Si is highly desirable as such a sample may well be fully compatible with existing Si CMOS technology. However, there is a dearth of such a study regarding Cd3As2 films grown on Si showing the chiral anomaly. Here, for the first time, we report the novel preparation and fabrication technique of a Cd3As2 (112) film on a Si (111) substrate with a ZnTe (111) buffer layer which explicitly shows the chiral anomaly with a nontrivial Berry's phase of pi. Despite the Hall carrier density (n(3D)approximate to 9.42x1017 cm(-3)) of our Cd3As2 film, which is almost beyond the limit for the portents of a 3D Dirac semimetal to emerge, we observe large linear magnetoresistance in a perpendicular magnetic field and negative magnetoresistance in a parallel magnetic field. These results clearly demonstrate the chiral magnetic effect and 3D Dirac semimetallic behavior in our silicon-based Cd3As2 film. Our tailoring growth of Cd3As2 on a conventional substrate such as Si keeps the sample quality, while also achieving a low carrier concentration.
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页数:8
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