Angular distribution of species in pulsed electron beam deposition of BaxSr1-xTiO3

被引:0
作者
Dobrin, D. [1 ]
Burducea, I. [2 ]
Iancu, D. [2 ]
Burducea, C. [2 ]
Gherendi, F. [1 ]
Nistor, M. [1 ]
机构
[1] Natl Inst Lasers Plasma & Radiat Phys NILPRP, L22 POB MG 36, Magurele 077125, Romania
[2] Horia Hulubei Natl Inst Res & Dev Phys & Nucl Engn, Magurele 077125, Romania
关键词
Angular distribution; Oxides; Pulsed electron deposition; Stoichiometric; Congruent transfer; LASER DEPOSITION; THIN-FILMS; LOW-TEMPERATURE; GROWTH;
D O I
10.1016/j.apsusc.2024.159757
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The angular thickness and composition profiles of thin films obtained by irradiating a BaxSr1-xTiO3 (x = 0.2) target with a pulsed electron beam were investigated by Rutherford backscattering spectrometry for argon and oxygen background gases at a pressure of about 10(-2) mbar. A "semi-sphere" holder was used, resulting in a fixed target to substrate distance of about 40 mm. The film thickness profiles have forward shaped peaks, with measurable thickness up to 80-90 degrees for major axis and 25 degrees for minor axis, and presents similar trend for both argon and oxygen background gas. The analysis of the congruent transfer of the elements from the target as a function of the angle showed that the film composition is not uniform over this wide angular range and differs with respect of the ablated target depending on the element used and on background gas.
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页数:6
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