Synthesis and optical properties of Ge clathrate films with and without Al doping

被引:2
作者
Aye, Tun Naing [1 ,2 ]
Kawaura, Yuto [3 ]
Kumar, Rahul [4 ]
Ohashi, Fumitaka [3 ,5 ]
Jha, Himanshu S. [5 ]
Kume, Tetsuji [1 ,2 ]
机构
[1] Gifu Univ, Int joint Dept Integrated Mech Engn Indian Inst Te, 1-1 Yanagido, Gifu 5011193, Japan
[2] Gifu Univ, 1-1 Yanagido, Gifu 5011193, Japan
[3] Gifu Univ, Grad Sch Nat Sci & Technol, Dept Energy Engn, 1-1 Yanagido, Gifu 5011193, Japan
[4] Natl Inst Technol KOSEN, Gifu Coll, Gifu 5010495, Japan
[5] Gifu Univ, Fac Engn, Dept Elect Elect & Comp Engn, 1-1 Yanagido, Gifu 5011193, Japan
关键词
type II Ge clathrate; thin film; semiconductor; CRYSTALLINE SILICON; SI; FORM; GAP;
D O I
10.35848/1347-4065/acade8
中图分类号
O59 [应用物理学];
学科分类号
摘要
An attempt to prepare thin films of Al-doped type II Ge clathrates Na- x (Al y Ge1-y )(136) was made by using amorphous Ge films including 0-7 atomic percent Al as the starting materials. The preparations were conducted using our recently established method, which enables the deposition of Na on the starting material with simultaneous or subsequent annealing under a high vacuum. X-ray diffraction measurements confirmed the type II clathrate structure in the prepared film. Smaller lattice constants and an Al-Ge related Raman peak found in the Al-included samples suggested the partial substitution of Al for Ge in the clathrate structure. Optical transmission measurements indicated that the fundamental absorption edge is shifted to higher energies due to the inclusion of Al.
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页数:6
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