共 50 条
- [31] New materials for 193-nm BARC application ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XX, PTS 1 AND 2, 2003, 5039 : 872 - 877
- [32] Design considerations for 193-nm positive resists MICROELECTRONICS TECHNOLOGY: POLYMERS FOR ADVANCED IMAGING AND PACKAGING, 1995, 614 : 255 - 270
- [34] Optimization of equipment for 193-nm immersion processing Advances in Resist Technology and Processing XXII, Pt 1 and 2, 2005, 5753 : 799 - 806
- [36] Testing of optical materials for 193-nm applications OPTICAL SYSTEMS CONTAMINATION AND DEGRADATION, 1998, 3427 : 411 - 418
- [37] Damage testing of pellicles for 193-nm lithography OPTICAL MICROLITHOGRAPHY XI, 1998, 3334 : 480 - 495
- [39] Analysis of 193-nm immersion specific defects ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXIII, PTS 1 AND 2, 2006, 6153 : U666 - U676