Tunable room-temperature ferromagnetism in RF magnetron sputtered Al2Cr2Cu2O8 thin film

Metal oxide solid solution thin films containing ternary mixtures of Alumina (Al2O3), Chromia (Cr2O3) and Cupric oxide (CuO) were successfully prepared combinatorially on FTO, quartz glass and Si substrates using radio frequency (RF) magnetron sputtering (vertical geometry; on-axis sputtering) technique with RF powers of 200 W and 100 W. XRD analysis prove the development of tetragonal phase Al2Cr2Cu2O8 in sputtering target. Al2Cr2-Cu2O8 film deposited on Si wafer and quartz glass exhibits amorphous nature, whereas, the film deposited on FTO substrates exhibit crystalline structure with tetragonal phase owing to polycrystalline nature of the FTO substrates. Formation of high compositional purity with acceptable stoichiometric ratio of ternary metal oxide mixtures of Al2Cr2Cu2O8 was ascertained from the EDX spectra. The thicknesses of Al2Cr2Cu2O8 thin films are found to be in the ranges from 259 to 314 nm. Optical study showed that the optical energy band gap of Al2Cr2Cu2O8 thin film deposited on quartz substrates increased to 3.84 eV from 3.78 eV with decreasing RF power from 200 W to 100 W. The spin orbital splitting (SOS) between Cr 2p1/2 -Cr 2p3/2 and Cu 2p1/2 -Cu 2p3/2 were measured to be 9.9 eV and 19.3 eV by XPS for 200 W sputtered Al2Cr2Cu2O8 film on quartz substrate, which are the characteristics of Cr3+ and Cu2+ oxidation states, respectively. In addition, XPS analysis also confirms the presence of various oxygen vacancies in Al2Cr2Cu2O8 thin films (as-deposited and 1000 degrees C annealed films) on quartz substrate with RF power of 200 W, which is the most favorable condition for the presence of room temperature ferromagnetic properties observed in the present study.