Aluminum doped zinc oxide thin films with lower activation energy prepared by radio frequency magnetron sputtering

被引：0
|
作者：
Ullah, Sana [1 ]
机构：
[1] Khwaja Fareed Univ Engn & Informat Technol, Inst Mech & Mfg Engn, Rahim Yar Khan 64200, Pakistan
来源：
FUNCTIONAL MATERIALS | 2023年 / 30卷 / 03期
关键词：
aluminium zinc oxide; zinc oxide; n-type materials; activation energy; doping; magnetron sputtering; ZNO; DEFECTS;
D O I：
10.15407/fm30.03.338
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Thin films of aluminum-doped zinc oxide (AZO) with reduced activation energy have been obtained and studied. Thin aluminum-doped zinc oxide films were grown by RF magnetron sputtering on silicon and glass substrates with different oxygen content in working gases (Ar + O-2). It was found that the activation energy of aluminum-doped zinc oxide films is about 0.03 eV and varies with the oxygen content.
引用
收藏
页码：338 / 343
页数：6
相关论文
共 50 条
  • [11] Preparation and Characterization of Transparent Conductive Zinc Doped Tin Oxide Thin Films Prepared by Radio-frequency Magnetron Sputtering
    Zhao Jiang
    Ni Jiamiao
    Zhao Xiujian
    Xiong Yuli
    JOURNAL OF WUHAN UNIVERSITY OF TECHNOLOGY-MATERIALS SCIENCE EDITION, 2011, 26 (03): : 388 - 392
  • [12] Preparation and Characterization of Transparent Conductive Zinc Doped Tin Oxide Thin Films Prepared by Radio-frequency Magnetron Sputtering
    赵江
    赵修建
    Journal of Wuhan University of Technology(Materials Science Edition), 2011, 26 (03) : 388 - 392
  • [13] Textured surface aluminum-doped zinc oxide thin films prepared by direct current magnetron sputtering
    Li, Lin-Na
    Chen, Xin-Liang
    Liu, Chen
    Sun, Jian
    Geng, Xin-Hua
    Zhao, Ying
    Guangdianzi Jiguang/Journal of Optoelectronics Laser, 2010, 21 (04): : 559 - 564
  • [14] Aluminum-Doped Zinc Oxide Thin Films Prepared by Sol-Gel and RF Magnetron Sputtering
    Wu, G. M.
    Chen, Y. F.
    Lu, H. C.
    ACTA PHYSICA POLONICA A, 2011, 120 (01) : 149 - 152
  • [15] Transparent and conductive aluminum doped zinc oxide films prepared by mid-frequency reactive magnetron sputtering
    Szyszka, B
    2ND INTERNATIONAL CONFERENCE ON COATINGS ON GLASS, ICCG: HIGH-PERFORMANCE COATINGS FOR TRANSPARENT SYSTEMS IN LARGE-AREA AND/OR HIGH-VOLUME APPLICATIONS, 1999, : 249 - 254
  • [16] Structural and electrical properties of fluorine-doped zinc tin oxide thin films prepared by radio-frequency magnetron sputtering
    Pandey, R.
    Cho, S. H.
    Hwang, D. K.
    Choi, W. K.
    CURRENT APPLIED PHYSICS, 2014, 14 (06) : 850 - 855
  • [17] Transparent and conductive aluminum doped zinc oxide films prepared by mid-frequency reactive magnetron sputtering
    Szyszka, B
    THIN SOLID FILMS, 1999, 351 (1-2) : 164 - 169
  • [18] Comparative Study of Aluminum-Doped Zinc Oxide, Gallium-Doped Zinc Oxide and Indium-Doped Tin Oxide Thin Films Deposited by Radio Frequency Magnetron Sputtering
    Khan, Shadab
    Stamate, Eugen
    NANOMATERIALS, 2022, 12 (09)
  • [19] Characterizations of nickel oxide thin films prepared by reactive radio frequency magnetron sputtering
    Xiao, Z. H.
    Xia, X. F.
    Xu, S. J.
    Luo, Y. P.
    Zhong, W.
    Ou, H.
    Jiang, E. S.
    PROCEEDINGS OF THE 5TH INTERNATIONAL CONFERENCE ON ADVANCED DESIGN AND MANUFACTURING ENGINEERING, 2015, 39 : 827 - 832
  • [20] Structural, electrical and optical properties of zirconium-doped zinc oxide films prepared by radio frequency magnetron sputtering
    Lv, Maoshui
    Xiu, Xianwu
    Pang, Zhiyong
    Dai, Ying
    Ye, Lina
    Cheng, Chuanfu
    Han, Shenghao
    THIN SOLID FILMS, 2008, 516 (08) : 2017 - 2021
12345