LIQUID-IMMERSION INCLINED-ROTATED UV LITHOGRAPHY FOR MICRO SUCTION CUP ARRAY

被引：1

作者：

Kagawa, Gakuto ^{[1
]}

Takahashi, Hidetoshi ^{[1
]}

机构：

[1] Keio Univ, Tokyo, Japan

来源：

2023 IEEE 36TH INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, MEMS | 2023年

关键词：

Suction cup; Inclined/rotated lithography; Liquid-immersion lithography; MICROSTRUCTURES;

D O I：

10.1109/MEMS49605.2023.10052567

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper reports liquid-immersion inclined/rotated UV lithography for fabricating micro suction cups. Microstructures such as micro suction cups have been applied in various applications. However, the conventional fabrication method had limitations in suction force due to the insufficient inclination angle. We proposed liquid-immersion to inclined/rotated exposure (IRE), enabling greater microstructure inclination angles. IRE equipment was developed to fabricate PDMS micro suction cup arrays. The experimental inclination angle reached 51 degrees, nearly doubling the conventional IRE method.

引用

页码：610 / 612

页数：3

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