Molecular Dynamics Study on the Mechanism of Gallium Nitride Radiation Damage by Alpha Particles

被引:1
作者
Liu, Yang [1 ,2 ,3 ]
Xiong, Zhenpeng [1 ]
Ouyang, Xiaoping [1 ,3 ]
机构
[1] North China Elect Power Univ, Sch Nucl Sci & Engn, Beijing 102206, Peoples R China
[2] East China Univ Technol, State Key Lab Nucl Resources & Environm, Nanchang 330013, Peoples R China
[3] State Key Lab Intense Pulsed Radiat Simulat & Effe, Xian 710024, Peoples R China
基金
中国国家自然科学基金;
关键词
molecular dynamics; GaN; & alpha; -particle; displacement damage effects; cumulative injection; amorphization; IMPLANTATION; GRAPHENE; SIMULATION; STABILITY; NITROGEN; SILICON; GAN;
D O I
10.3390/ma16124224
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In special applications in nuclear reactors and deep space environments, gallium nitride detectors are subject to irradiation by a-particles. Therefore, this work aims to explore the mechanism of the property change of GaN material, which is closely related to the application of semiconductor materials in detectors. This study applied molecular dynamics methods to the displacement damage of GaN under a-particle irradiation. A single a-particle-induced cascade collision at two incident energies (0.1 and 0.5 MeV) and multiple a-particle injections (by five and ten incident a-particles with injection doses of 2 x 10(12) and 4 x 10(12) ions/cm(2), respectively) at room temperature (300 K) were simulated by LAMMPS code. The results show that the recombination efficiency of the material is about 32% under 0.1 MeV, and most of the defect clusters are located within 125 A, while the recombination efficiency of 0.5 MeV is about 26%, and most of the defect clusters are outside 125 A. However, under multiple a-particle injections, the material structure changes, the amorphous regions become larger and more numerous, the proportion of amorphous area is about 27.3% to 31.9%, while the material's self-repair ability is mostly exhausted.
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页数:14
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