Oxygen and water are the most reactive gases of the ambient air. The adsorption of both molecules on transition metal surfaces have been studied extensively, but mostly separately. However, water and oxygen usually co-exist, and therefore realistic systems need to take into consideration both simultaneously. As these adsorption reactions are so common, state-of-the-art results are beneficial as they capture large trends as accurately as possible. A comprehensive study of oxygen and water co-adsorption and dissociation on Ag(111)-, Au(111)-, Pd(111)-, Pt(111)-, Rh(111)-and Ni(111)-surfaces have been performed using density functional theory. We present a very strong general trend, where dissociated oxygen systematically lowers the activation energy of water dissociation on transition metal surfaces. This makes the oxygen dissociation the rate-determining step of the water dissociation reaction. The effect is caused by the additional pathway that the dissociated oxygen enables for the dissociation of water molecule.
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North West Univ, Lab Appl Mol Modelling, Res Focus Area Chem Resource Beneficiat, Hoffman St, ZA-2520 Potchefstroom, South AfricaCardiff Univ, Sch Chem, Main Bldg,Pk Pl, Cardiff CF10 3AT, Wales
Botha, Louise M.
Ungerer, Marietjie J.
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Cardiff Univ, Sch Chem, Main Bldg,Pk Pl, Cardiff CF10 3AT, WalesCardiff Univ, Sch Chem, Main Bldg,Pk Pl, Cardiff CF10 3AT, Wales
Ungerer, Marietjie J.
van Sittert, Cornelia G. C. E.
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North West Univ, Lab Appl Mol Modelling, Res Focus Area Chem Resource Beneficiat, Hoffman St, ZA-2520 Potchefstroom, South AfricaCardiff Univ, Sch Chem, Main Bldg,Pk Pl, Cardiff CF10 3AT, Wales
机构:
Univ Otago, MacDiarmid Inst Adv Mat & Nanotechnol, POB 56, Dunedin 9054, New Zealand
Univ Otago, Dept Chem, POB 56, Dunedin 9054, New ZealandUniv Otago, MacDiarmid Inst Adv Mat & Nanotechnol, POB 56, Dunedin 9054, New Zealand
Casey-Stevens, Caitlin A.
Asmundsson, Hrolfur
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Univ Iceland, Sci Inst, Reykjavik, Iceland
Univ Iceland, Fac Ind Engn Mech Engn & Comp Sci, Reykjavik, IcelandUniv Otago, MacDiarmid Inst Adv Mat & Nanotechnol, POB 56, Dunedin 9054, New Zealand
Asmundsson, Hrolfur
Skulason, Egill
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Univ Iceland, Sci Inst, Reykjavik, Iceland
Univ Iceland, Fac Ind Engn Mech Engn & Comp Sci, Reykjavik, IcelandUniv Otago, MacDiarmid Inst Adv Mat & Nanotechnol, POB 56, Dunedin 9054, New Zealand
Skulason, Egill
Garden, Anna L.
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h-index: 0
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Univ Otago, MacDiarmid Inst Adv Mat & Nanotechnol, POB 56, Dunedin 9054, New Zealand
Univ Otago, Dept Chem, POB 56, Dunedin 9054, New ZealandUniv Otago, MacDiarmid Inst Adv Mat & Nanotechnol, POB 56, Dunedin 9054, New Zealand
机构:
North West Univ, Lab Appl Mol Modelling, Res Focus Area Chem Resource Beneficiat, Hoffman St, ZA-2520 Potchefstroom, South AfricaCardiff Univ, Sch Chem, Main Bldg,Pk Pl, Cardiff CF10 3AT, Wales
Botha, Louise M.
Ungerer, Marietjie J.
论文数: 0引用数: 0
h-index: 0
机构:
Cardiff Univ, Sch Chem, Main Bldg,Pk Pl, Cardiff CF10 3AT, WalesCardiff Univ, Sch Chem, Main Bldg,Pk Pl, Cardiff CF10 3AT, Wales
Ungerer, Marietjie J.
van Sittert, Cornelia G. C. E.
论文数: 0引用数: 0
h-index: 0
机构:
North West Univ, Lab Appl Mol Modelling, Res Focus Area Chem Resource Beneficiat, Hoffman St, ZA-2520 Potchefstroom, South AfricaCardiff Univ, Sch Chem, Main Bldg,Pk Pl, Cardiff CF10 3AT, Wales
机构:
Univ Otago, MacDiarmid Inst Adv Mat & Nanotechnol, POB 56, Dunedin 9054, New Zealand
Univ Otago, Dept Chem, POB 56, Dunedin 9054, New ZealandUniv Otago, MacDiarmid Inst Adv Mat & Nanotechnol, POB 56, Dunedin 9054, New Zealand
Casey-Stevens, Caitlin A.
Asmundsson, Hrolfur
论文数: 0引用数: 0
h-index: 0
机构:
Univ Iceland, Sci Inst, Reykjavik, Iceland
Univ Iceland, Fac Ind Engn Mech Engn & Comp Sci, Reykjavik, IcelandUniv Otago, MacDiarmid Inst Adv Mat & Nanotechnol, POB 56, Dunedin 9054, New Zealand
Asmundsson, Hrolfur
Skulason, Egill
论文数: 0引用数: 0
h-index: 0
机构:
Univ Iceland, Sci Inst, Reykjavik, Iceland
Univ Iceland, Fac Ind Engn Mech Engn & Comp Sci, Reykjavik, IcelandUniv Otago, MacDiarmid Inst Adv Mat & Nanotechnol, POB 56, Dunedin 9054, New Zealand
Skulason, Egill
Garden, Anna L.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Otago, MacDiarmid Inst Adv Mat & Nanotechnol, POB 56, Dunedin 9054, New Zealand
Univ Otago, Dept Chem, POB 56, Dunedin 9054, New ZealandUniv Otago, MacDiarmid Inst Adv Mat & Nanotechnol, POB 56, Dunedin 9054, New Zealand