Reflective x-ray masks for x-ray lithography

被引：0

作者：

Chumak, V. S. ^{[1
]}

Peredkov, S. ^{[2
]}

Devizenko, A. Yu ^{[1
]}

Kopylets, I. A. ^{[1
]}

Pershyn, Yu P. ^{[1
]}

机构：

[1] Natl Tech Univ, Kharkiv Polytech Inst, 2 Kyrpychova St, UA-61002 Kharkiv, Ukraine

[2] Max Planck Inst Chem Energy Convers, Dept Inorgan Spect, Stiftstr 34-36, D-45470 Mulheim, Germany

来源：

JOURNAL OF MICROMECHANICS AND MICROENGINEERING | 2024年 / 34卷 / 04期

关键词：

x-ray lithography; reflective x-ray mask; x-ray multilayer mirror; image compression; micron imprints; MULTILAYERS;

D O I：

10.1088/1361-6439/ad2f48

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Application of x-ray multilayers as reflective x-ray masks for x-ray lithography is proposed. The mask is a specially prepared multilayer mirror capable to selectively reflect x-rays. The use of grazing geometry allows a pattern design on the mask to be compressed in one direction. Application examples are given for the masks (WC/Si multilayers) with two types of a radiation source: an x-ray tube (lambda = 0.154 nm) and a synchrotron (lambda similar to 0.35 nm). The compression of the mask segments by 14-33 times with the imprint size in the resist plane 3.5-4 mu m is obtained. The advantages of the proposed masks are given. The possibilities of obtaining submicron imprints are discussed.

引用

页数：10

共 50 条

[1] Cost effective masks for deep X-ray lithography
Scheunemann, HU
Loechel, B
Jian, L
Schondelmaier, D
Desta, YM
Goettert, J
SMART SENSORS, ACTUATORS, AND MEMS, PTS 1 AND 2, 2003, 5116 : 775 - 781
[2] Thermal management of masks for deep x-ray lithography
Khounsary, A
Chojnowski, D
Mancini, DC
Lai, B
Dejus, R
HIGH HEAT FLUX AND SYNCHROTRON RADIATION BEAMLINES, 1997, 3151 : 92 - 101
[3] X-ray lenses fabricated by deep x-ray lithography
Mancini, DC
Moldovan, N
Divan, R
DeCarlo, F
Yaeger, J
DESIGN AND MICROFABRICATION OF NOVEL X-RAY OPTICS, 2002, 4783 : 28 - 36
[4] Status of diamond as membrane material for X-ray lithography masks
Ravet, MF
Rousseaux, F
DIAMOND AND RELATED MATERIALS, 1996, 5 (6-8) : 812 - 818
[5] X-ray reduction imaging of inclined reflective masks at critical angles
Artyukov, I. A.
Busarov, A. S.
Vinogradov, A. V.
Popov, N. L.
QUANTUM ELECTRONICS, 2016, 46 (09) : 839 - 844
[6] Validation of X-ray lithography and development simulation system for moving mask deep X-ray lithography
Hirai, Y
Hafizovic, S
Matsuzuka, N
Korvink, JG
Tabata, O
JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 2006, 15 (01) : 159 - 168
[7] Fabrication of absorption gratings with X-ray lithography for X-ray phase contrast imaging
Wang, Bo
Wang, Yu-Ting
Yi, Fu-Ting
Zhang, Tian-Chong
liu, Jing
Zhou, Yue
INTERNATIONAL JOURNAL OF MODERN PHYSICS B, 2018, 32 (13):
[8] Kinoform X-ray lens creation in polymer materials by deep X-ray lithography
Nazmov, V
Shabel'nikov, L
Pantenburg, FJ
Mohr, J
Reznikov, E
Snigirev, A
Snigireva, I
Kouznetsov, S
DiMichiel, M
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2004, 217 (03) : 409 - 416
[9] Present status of X-ray lithography
Yamabe, M
PHOTOMASK AND X-RAY MASK TECHNOLOGY V, 1998, 3412 : 88 - 98
[10] Positioning technology in X-ray lithography
Ishihara, S
INTERNATIONAL JOURNAL OF THE JAPAN SOCIETY FOR PRECISION ENGINEERING, 1996, 30 (02): : 103 - 106

← 1 2 3 4 5 →