共 67 条
Enhanced resistance to helium irradiations through unusual interaction between high-entropy-alloy and helium
被引:31
作者:
Cheng, Tao
[1
,2
]
Wei, Guo
[1
,2
]
Jiang, Shengming
[3
]
Zhang, Jian
[3
]
Wang, Yongqiang
[4
]
Liu, Peng
[5
,6
]
Hong, Mengqing
[1
,2
]
Guo, Enkai
[1
,2
]
Zhong, Fen
[1
,2
]
Cai, Guangxu
[1
,2
]
Jiang, Changzhong
[1
,2
]
Ren, Feng
[1
,2
]
机构:
[1] Wuhan Univ, Ctr Ion Beam Applicat, Sch Phys & Technol, Hubei Nucl Solid Phys Key Lab, Wuhan 430072, Peoples R China
[2] Wuhan Univ, MOE Key Lab Artificial Micro & Nanostruct, Wuhan 430072, Peoples R China
[3] Xiamen Univ, Coll Energy, Xiamen, Fujian, Peoples R China
[4] Los Alamos Natl Lab, Mat Sci & Technol Div, Los Alamos, NM 87545 USA
[5] Shandong Univ, Inst Frontier & Interdisciplinary Sci, Qingdao 266237, Shandong, Peoples R China
[6] Shandong Univ, Key Lab Particle Phys & Particle Irradiat MOE, Qingdao 266237, Shandong, Peoples R China
来源:
基金:
中国国家自然科学基金;
关键词:
High-entropy alloys;
In-situ irradiation;
MD simulation;
He bubble;
Nanochannels;
BUBBLE FORMATION;
ION-IRRADIATION;
TUNGSTEN;
SURFACE;
MICROSTRUCTURE;
EVOLUTION;
MODEL;
D O I:
10.1016/j.actamat.2023.118765
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
Finding high performance plasma-facing materials (PFMs) is one of the most important and challenging tasks for realizing the commercial application of fusion reactors. Herein, we found the CrMoTaWV high entropy alloy (HEA) is highly resistant to low-energy and high-flux He plasma exposure. The nanochannel HEA film has 20 times higher initial fluence for the formation of fuzz and a remarkable 8.9 times slower fuzz growth rate than those of W. Combining the in-situ TEM observation and the Molecular dynamics (MD) simulation of the He bubble growth process, a new mechanism for the enhanced radiation resistance in HEA with the unusual interaction between HEA and He is found, where, differing from traditional metal, bubble growth in HEA leads to non-directional emission of interstitial atoms while HEA greatly suppress the growth of He bubbles. The special nanochannel structure further rise the radiation resistance through releasing He out of the HEA film and reducing the He concentration. This new nanochannel refractory HEA material presents a promising choice as the PFMs with excellent performance and a much longer serving lifetime for future commercial fusion reactors.
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页数:10
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