Effect of EBL thickness on the performance of AlGaN deep ultraviolet light-emitting diodes with polarization-induced doping hole injection layer

被引:5
作者
Cao, Yiwei [1 ]
Lv, Quanjiang [1 ]
Yang, Tianpeng [2 ,3 ]
Mi, Tingting [3 ]
Wang, Xiaowen [3 ]
Liu, Wei [3 ]
Liu, Junlin [1 ]
机构
[1] Jiangsu Univ, Sch Mat Sci & Engn, Zhenjiang 212013, Peoples R China
[2] EpiTop Optoelect Co Ltd, Maanshan 243000, Peoples R China
[3] Maanshan Jason Semicond Co Ltd, Maanshan 243000, Peoples R China
来源
MICRO AND NANOSTRUCTURES | 2023年 / 175卷
基金
中国国家自然科学基金;
关键词
DUV-LED; EBL; Polarization -induced doping; Quantum efficiency; Reliability; ELECTRON BLOCKING LAYER; LEDS;
D O I
10.1016/j.micrna.2022.207489
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Numerical simulation results reveal that introducing polarization-induced doping hole injection layer (HIL) in the DUV-LEDs results in a downward band-bending at the EBL/HIL interface, which causes more severe electron leakage. The effect of optimizing EBL thickness on the performance of DUV-LEDs was investigated to mitigate the side-effects due to the introduction of polarization -induced doping HIL. The experimental results show that as the EBL thickness increases, the external quantum efficiency (EQE) and wall-plug efficiency (WPE) of the DUV-LEDs increase and then decrease, while the efficiency droop in an opposite trend. The maximum EQE and WPE of 5.95% and 5.48%, respectively, were achieved when the EBL thickness was 20 nm. Meanwhile, increasing the EBL thickness can improve the DUV-LED reliability. However, an excessively thick EBL will deteriorate the reliability due to generating more Joule heat. Therefore, the reliability of DUV-LED was optimal when the EBL thickness was 25 nm.
引用
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页数:9
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