Evaluation of dynamic thiol/disulfide balance and oxidative metabolism in obsessive compulsive disorder patients

Objective: We aimed to compare Total Oxidant Level (TOL), Total Antioxidant Level (TAL), Oxidative Stress Index (OSI), Thiol/Disulfide levels, Plasma Malondialdehyde (MDA) levels in both plasma and erythrocyte patients with OCD and healthy controls. Method: Our study included 47 patients with OCD and 49 healthy controls. Sociodemographic data form was applied to all participants, CGI and Y-BOCS were applied to the patient group. TAL and TOL measurements were made in both plasma and erythrocytes, and Malondialdehyde (MDA) and Thiol/Disulfide measurements were made only in plasma. Results: TAL, TOL, OSI and MDA values in the plasma of the patient and control groups were compared, no statistically significant difference was found. However, erythrocyte TAS level was lower in the patient group (p<0.05) and OSI level was higher (p<0.05) in the patient group. While no difference was observed in plasma total thiol level in the patient group compared to the cont-rols, plasma native thiol levels were significantly higher (p<0.001) and plasma disulfide levels were significantly lower (p<0.05). Conclusion: The high level of native thiol, an antioxidant molecule in plasma, in OCD patients can be interpreted as an effort to compensate for the decreased antioxidant capacity in erythrocytes. According to these results, we think that when evaluating oxidative stress parameters in psychiatric diseases such as OCD, it is important to study the thiol/disulfide ratio as well as the total oxidant capacity of the plasma, and it would be appropriate to measure these parameters not only in the plasma but also in the erythrocyte.