Spectral purity systems applied for laser-produced plasma extreme ultraviolet lithography sources: a review

被引：15

作者：

Lin, Nan ^{[1
,2
,3
]}

Chen, Yunyi ^{[1
,2
]}

Wei, Xin ^{[1
,2
]}

Yang, Wenhe ^{[1
,2
]}

Leng, Yuxin ^{[2
,3
]}

机构：

[1] Shanghai Univ, Sch Microelect, Shanghai, Peoples R China

[2] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Dept Precis Opt Engn, Shanghai, Peoples R China

[3] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Dept Precis Opt Engn, Shanghai 201800, Peoples R China

来源：

HIGH POWER LASER SCIENCE AND ENGINEERING | 2023年 / 11卷

关键词：

collector mirror; extreme ultraviolet lithography; spectral purity filter; ANGLE-RESOLVED SCATTERING; EUV SOURCE; DIFFRACTION EFFICIENCY; MULTILAYER COATINGS; RESEARCH PROGRESS; BLAZED GRATINGS; FABRICATION; MIRROR; UPDATE; FILTER;

D O I：

10.1017/hpl.2023.53

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

With the development of high-volume manufacturing for very-large-scale integrated circuits, the purity of the light source in the extreme ultraviolet lithography (EUVL) system needs to fulfil extreme requirements in order to avoid thermal effect, optical distortion and critical dimension errors caused by out-of-band radiations. This paper reviews the key technologies and developments of the spectral purity systems for both a free-standing system and a built-in system integrated with the collector. The main challenges and developing trends are also discussed, with a view towards practical applications for further improvement. Designing and manufacturing spectral purity systems for EUVL is not a single task; rather, it requires systematic considerations for all relevant modules. Moreover, the requirement of spectral purity filters drives the innovation in filtering technologies, optical micromachining and advanced metrology.

引用

页数：16