In-situ crystalline TiNi thin films deposited by HiPIMS at a low substrate temperature

被引：6
|
作者：
Bai, Xuebing [1 ]
Cai, Qun [1 ]
Xie, Wenhao [1 ]
Zeng, Yuqiao [1 ]
Chu, Chenglin [1 ]
Zhang, Xuhai [1 ]
机构：
[1] Southeast Univ, Sch Mat Sci & Engn, Jiangsu Key Lab Adv Met Mat, Nanjing 211189, Peoples R China
来源：
SURFACE & COATINGS TECHNOLOGY | 2023年 / 455卷
基金：
中国国家自然科学基金;
关键词：
TiNi thin films; Crystallization; HiPIMS; A low substrate temperature; MARTENSITIC PHASE-TRANSFORMATIONS; MEMORY ALLOY-FILMS; MEMS APPLICATIONS; STRAIN FIELDS; BEHAVIOR; MICROSTRUCTURE; EVOLUTION; KINETICS;
D O I：
10.1016/j.surfcoat.2022.129196
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Magnetron sputtered TiNi thin films usually exhibit an amorphous structure and need a high substrate tem-perature (>450 degrees C) or a post-annealing treatment (>500 degrees C) to promote crystallization. However, these treat-ments could extremely limit the use of low melting point substrate materials. In this study, TiNi thin films were prepared by HiPIMS using different deposition parameters. The structure and phase transformation of TiNi films were investigated. Based on SEM, XRD, TEM, DSC and electrical resistivity analysis, results show that it is possible to deposit dense crystalline TiNi thin films at a low substrate temperature (230 degrees C). The crystallization mechanism was also discussed. Ions energy and substrate temperatures significantly affected the formation of crystalline structures.
引用
收藏
页数：10
相关论文
共 50 条
  • [1] A low temperature in-situ crystalline TiNi shape memory thin film deposited by magnetron sputtering
    Cicek, Hikmet
    Efeoglu, Ihsan
    Totik, Yasar
    Ezirmik, Kadri Vefa
    Arslan, Ersin
    SURFACE & COATINGS TECHNOLOGY, 2015, 284 : 90 - 93
  • [2] The effect of substrate temperature on the properties of (AlCrNbSiTiV)N films deposited by HIPIMS
    Liu, Zhi-wei
    Hsu, Chun-Yao
    Wu, Ming-Chang
    Tsao, Chung-Chen
    INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY, 2019, 104 (9-12) : 4509 - 4516
  • [3] Characterization of SiC Thin Films Deposited by HiPIMS
    Leal, Gabriela
    Bastos Campos, Tiago Moreira
    da Silva Sobrinho, Argemiro Soares
    Pessoa, Rodrigo Savio
    Maciel, Homero Santiago
    Massi, Marcos
    MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, 2014, 17 (02): : 472 - 476
  • [4] HiPIMS and bipolar HiPIMS techniques for tunable phase formation of yttrium oxide thin films at low-temperature
    Ahn, Soeun
    Jeong, Eunbi
    Jeon, Kyoungho
    Lim, Sang Ho
    Han, Seunghee
    VACUUM, 2024, 226
  • [5] Effect of substrate bias on properties of HiPIMS deposited vanadium nitride films
    Hajihoseini, H.
    Kateb, M.
    Ingvarsson, S.
    Gudmundsson, J. T.
    THIN SOLID FILMS, 2018, 663 : 126 - 130
  • [6] CrN thin films deposited by HiPIMS in DOMS mode
    Ferreira, F.
    Oliveira, J. C.
    Cavaleiro, A.
    SURFACE & COATINGS TECHNOLOGY, 2016, 291 : 365 - 375
  • [7] Copper thin films deposited using different ion acceleration strategies in HiPIMS
    Viloan, Rommel Paulo B.
    Helmersson, Ulf
    Lundin, Daniel
    SURFACE & COATINGS TECHNOLOGY, 2021, 422
  • [8] Thermochromic VO2 thin films deposited by HiPIMS
    Fortier, J. -P.
    Baloukas, B.
    Zabeida, O.
    Klemberg-Sapieha, J. E.
    Martinu, L.
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2014, 125 : 291 - 296
  • [9] Tailoring microstructure, mechanical and tribological properties of NiTi thin films by controlling in-situ annealing temperature
    Momeni, Soroush
    Biskupek, Johannes
    Tillmann, Wolfgang
    THIN SOLID FILMS, 2017, 628 : 13 - 21
  • [10] HiPIMS and bipolar HiPIMS techniques for tunable phase formation of yttrium oxide thin films at low-temperature
    Ahn, Soeun
    Jeong, Eunbi
    Jeon, Kyoungho
    Lim, Sang Ho
    Han, Seunghee
    VACUUM, 2024, 226
12345