The FMR line width and the structure in YIG films deposited by MOD on silicon (100)

被引：8

作者：

Assis, L. K. C. S. ^{[1
]}

Abrao, J. E. ^{[2
]}

Carvalho, A. S. ^{[1
]}

Goncalves, L. A. P. ^{[1
,3
]}

Galembeck, A. ^{[1
,4
]}

Padron-Hernandez, E. ^{[1
,2
]}

机构：

[1] Univ Fed Pernambuco, Posgrad Ciencia Mat, Recife, Pe, Brazil

[2] Univ Fed Pernambuco, Dept Fis, Recife, Pe, Brazil

[3] Inst Fed Pernambuco, Dept Engn Mecan, Recife, Pe, Brazil

[4] Univ Fed Pernambuco, Dept Quim Fundamental, Recife, Pe, Brazil

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 2023年 / 568卷

关键词：

YIG; MOD; Thin films; FMR; Microstructure; IRON-GARNET FILMS; MAGNETIC-PROPERTIES; MORPHOLOGY; MICROSTRUCTURE; RELAXATION; Y3FE5O12; GROWTH;

D O I：

10.1016/j.jmmm.2023.170388

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this work, yttrium-iron garnet (YIG) films deposited on silicon subtract were studied by ferromagnetic resonance (FMR). The samples were prepared by using the Metal-Organic Decomposition (MOD) method on two different thermal treatments (750 degrees C and 850 degrees C). The X-ray diffraction suggested the single phase of YIG while atomic force microscopy and scanning electron microscopy reveled film roughness, R-q < 0.2 nm. The FMR measurements showed very different linewidth of 139 Oe for the sample obtained at 750 degrees C and sample at 850 degrees C had a smaller linewidth of 93 Oe. The difference was mainly attributed to the different structural ordering of the two samples from the heat treatment at different temperatures.

引用

页数：4

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