Atomic Layer Processing of MoS2

被引：0

作者：

Wesley, Jen ^{[1
]}

Hues, John D. ^{[1
]}

Soares, Jake ^{[1
]}

Letourneau, Steven ^{[1
,2
]}

Lawson, Matthew ^{[1
]}

Choudhury, Devika ^{[2
]}

Mane, Anil U. ^{[2
]}

Lu, Yu ^{[1
,3
]}

Wu, Yaqiao ^{[1
,3
]}

Hues, Steven M. ^{[1
]}

Li, Lan ^{[1
,3
]}

Elam, Jeffrey W. ^{[2
]}

Graugnard, Elton ^{[1
,3
]}

机构：

[1] Boise State Univ, Micron Sch Mat Sci & Engn, 1910 Univ Dr, Boise, ID 83725 USA

[2] Argonne Natl Lab, Appl Mat Div, 9700 S Cass Ave, Lemont, IL 60439 USA

[3] Ctr Adv Energy Studies, Idaho Falls, ID 83401 USA

来源：

2023 IEEE WORKSHOP ON MICROELECTRONICS AND ELECTRON DEVICES, WMED | 2023年

关键词：

D O I：

10.1109/WMED58543.2023.10097444

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：9 / 11

页数：3

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