Atomic Layer Processing of MoS2

被引：0
|
作者：
Wesley, Jen [1 ]
Hues, John D. [1 ]
Soares, Jake [1 ]
Letourneau, Steven [1 ,2 ]
Lawson, Matthew [1 ]
Choudhury, Devika [2 ]
Mane, Anil U. [2 ]
Lu, Yu [1 ,3 ]
Wu, Yaqiao [1 ,3 ]
Hues, Steven M. [1 ]
Li, Lan [1 ,3 ]
Elam, Jeffrey W. [2 ]
Graugnard, Elton [1 ,3 ]
机构：
[1] Boise State Univ, Micron Sch Mat Sci & Engn, 1910 Univ Dr, Boise, ID 83725 USA
[2] Argonne Natl Lab, Appl Mat Div, 9700 S Cass Ave, Lemont, IL 60439 USA
[3] Ctr Adv Energy Studies, Idaho Falls, ID 83401 USA
来源：
2023 IEEE WORKSHOP ON MICROELECTRONICS AND ELECTRON DEVICES, WMED | 2023年
关键词：
D O I：
10.1109/WMED58543.2023.10097444
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：9 / 11
页数：3
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