Microstructures, magnetic properties and microwave absorption of ion-implanted bismuth ferrite thin films

This study investigates the properties and performance of bismuth ferrite thin films on Kapton sheets as electromagnetic (EM) wave -absorbing materials. The main techniques employed in this study involved modifying the surface geometry and using electromagnetic wave -absorbing materials as surface coatings. X-ray diffraction analysis revealed a cubic crystal structure of the bismuth ferrite thin films. The bonding analysis showed the presence of Bi-O and Fe-O functional groups at 432.26 and 519.48 cm -1, respectively. Vibrating -sample magnetometry revealed the ferromagnetic behavior of the bismuth ferrite thin film, confirming that saturation magnetization decreased with increasing sputtering time. Moreover, the calcination temperature affected the coercive field; the higher the calcination temperature, the higher the coercivity of the BiFeO3 (BFO) thin film layer. Scanning electron microscopy with energy -dispersive X-ray spectroscopy of the bismuth ferrite thin films revealed the presence of Bi, Fe, and O-evenly and homogeneously distributed on the Kapton surface. After the ion implantation process, the atomic force microscopy test results showed an increased root -mean -square roughness (Rq). The root -mean -square roughness value for Kapton before the process was approximately 7.5 nm, while the root -mean -square roughness values for BFO 10 min and BFO 12.5 min were approximately 18.8 nm and 25.3 nm, respectively. The microwave absorption ability reached a maximum reflection loss value of40.4 dB (99.9 %) in the range of 9.98 GHz with a sputtering duration of 10 min. Therefore, these results suggest bismuth ferrite is a potential candidate as an EM wave absorber.