Mass spectrometric study of β-Ga2O3 growth process by metalorganic vapor phase epitaxy
被引:4
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作者:
Ikenaga, Kazutada
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机构:
Tokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
TAIYO NIPPON SANSO Corp, Minato Ku, Tokyo 1080014, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Ikenaga, Kazutada
[1
,2
]
Okuyama, Takahito
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机构:
Tokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Okuyama, Takahito
[1
]
Tozato, Haruka
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机构:
Tokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Tozato, Haruka
[1
]
Nishimura, Taro
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Tokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Nishimura, Taro
[1
]
Sasaki, Shogo
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Tokyo Univ Agr & Technol, FLOuRISH Inst, Koganei, Tokyo 1848588, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Sasaki, Shogo
[3
]
Goto, Ken
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Tokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Goto, Ken
[1
]
Ishikawa, Masato
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机构:
Gas Phase Growth Ltd, Koganei, Tokyo 1840011, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Ishikawa, Masato
[4
]
Takinami, Yoshihiko
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机构:
Kanomax Analyt Inc, Chofu, Tokyo 1820036, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Takinami, Yoshihiko
[5
]
Machida, Hideaki
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机构:
Gas Phase Growth Ltd, Koganei, Tokyo 1840011, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Machida, Hideaki
[4
]
Kumagai, Yoshinao
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机构:
Tokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Tokyo Univ Agr & Technol, FLOuRISH Inst, Koganei, Tokyo 1848588, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Kumagai, Yoshinao
[1
,3
]
机构:
[1] Tokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
[2] TAIYO NIPPON SANSO Corp, Minato Ku, Tokyo 1080014, Japan
[3] Tokyo Univ Agr & Technol, FLOuRISH Inst, Koganei, Tokyo 1848588, Japan
[4] Gas Phase Growth Ltd, Koganei, Tokyo 1840011, Japan
[5] Kanomax Analyt Inc, Chofu, Tokyo 1820036, Japan
MOVPE;
triethylgallium;
time-of-flight mass spectrometry;
DECOMPOSITION;
D O I:
10.35848/1347-4065/acc53c
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
In metalorganic vapor phase epitaxy of beta-Ga2O3 using triethylgallium (TEGa) and O-2 as precursors and Ar as the carrier gas, the gases directly above the substrate were sampled and analyzed by time-of-flight mass spectrometry. TEGa was found to decompose at 400 degrees C-600 degrees C via beta-hydrogen elimination reaction to generate gaseous Ga, hydrocarbons (C2H4, C2H2, C2H6), and H-2. When beta-Ga2O3 was grown at temperatures greater than 1000 degrees C and with input VI/III ratios greater than 100, the hydrocarbons and H-2 were combusted and CO2 and H2O were generated. The C and H impurity concentrations measured by secondary-ion mass spectrometry in the beta-Ga2O3(010) homoepitaxial layer grown under these conditions were less than their respective background levels. Thus, to grow beta-Ga2O3 without C and H contamination, conditions that favor the complete combustion of hydrocarbons and H-2 generated by the decomposition of TEGa should be used. (c) 2023 The Japan Society of Applied Physics
机构:
Chinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R ChinaChinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R China
Liu, XL
Lu, DC
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Chinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R ChinaChinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R China
Lu, DC
Wang, LS
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机构:
Chinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R ChinaChinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R China
Wang, LS
Wang, XH
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Chinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R ChinaChinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R China
Wang, XH
Wang, D
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机构:
Chinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R ChinaChinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R China
Wang, D
Lin, LY
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Chinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R ChinaChinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R China