Domain matching epitaxy of α-Ga2O3 thin film on sapphire by pulsed laser deposition

被引:1
作者
Lee, Sang-A [1 ]
Hwang, Jae-Yeol [1 ]
机构
[1] Pukyong Natl Univ, Dept Phys, Pusan 48513, South Korea
关键词
Ga2O3; Alpha phase; Domain matching epitaxy; Pulsed laser deposition; Thin film; GROWTH; BETA-GA2O3;
D O I
10.1007/s40042-023-00766-1
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Metastable (00l)-oriented rhombohedral alpha-Ga2O3 thin films with phase purity were epitaxially grown on c-plane alpha-Al2O3 substrates using pulsed laser deposition. It was elucidated that domain matching epitaxy enables the epitaxial growth of alpha-Ga2O3 thin film on alpha-Al2O3 substrate by stabilizing structural instability through reducing misfit strain. In reciprocal space mapping analyses of alpha-Ga2O3 thin films with different thicknesses, no considerable differences in lattice parameters (a = 4.977 angstrom and c = 13.442 angstrom) and the degree of misfit strain were identified. The optical bandgap of alpha-Ga2O3 thin film was modulated with crystal quality from 4.75 to 5.3 eV in the thickness range from 4 to 49 nm, indicating the characteristics of alpha-phase. Our results provide a facile way to stabilize the metastable alpha-phase of Ga2O3 using the alpha-Ga2O3/alpha-Al2O3 heterostructures through domain matching epitaxy with comprehensive structural characteristics and a promising potential for bandgap tuning for power devices, sensors, and solar-blind deep-ultra-violet photodetectors.
引用
收藏
页码:781 / 785
页数:5
相关论文
共 25 条
[1]   Materials issues and devices of α- and β-Ga2O3 [J].
Ahmadi, Elaheh ;
Oshima, Yuichi .
JOURNAL OF APPLIED PHYSICS, 2019, 126 (16)
[2]  
[Anonymous], 2016, Jpn. J. Appl. Phys, DOI DOI 10.7567/JJAP.55.1202B8
[3]   Czochralski growth and characterization of β-Ga2O3 single crystals [J].
Galazka, Z. ;
Uecker, R. ;
Irmscher, K. ;
Albrecht, M. ;
Klimm, D. ;
Pietsch, M. ;
Bruetzam, M. ;
Bertram, R. ;
Ganschow, S. ;
Fornari, R. .
CRYSTAL RESEARCH AND TECHNOLOGY, 2010, 45 (12) :1229-1236
[4]   Correlation between leakage current density and threading dislocation density in SiGe p-i-n diodes grown on relaxed graded buffer layers [J].
Giovane, LM ;
Luan, HC ;
Agarwal, AM ;
Kimerling, LC .
APPLIED PHYSICS LETTERS, 2001, 78 (04) :541-543
[5]   Gallium oxide (Ga2O3) metal-semiconductor field-effect transistors on single-crystal β-Ga2O3 (010) substrates [J].
Higashiwaki, Masataka ;
Sasaki, Kohei ;
Kuramata, Akito ;
Masui, Takekazu ;
Yamakoshi, Shigenobu .
APPLIED PHYSICS LETTERS, 2012, 100 (01)
[6]  
Hwang J.-Y., 2021, NEW PHYS SAE MULLI, V71, P347, DOI [10.3938/NPSM.71.347, DOI 10.3938/NPSM.71.347]
[7]  
Hwang JY, 2005, J KOREAN PHYS SOC, V47, pS288, DOI 10.3938/jkps.47.288
[8]   Evaluation of Misfit Relaxation in α-Ga2O3 Epitaxial Growth on α-Al2O3 Substrate [J].
Kaneko, Kentaro ;
Kawanowa, Hitoshi ;
Ito, Hiroshi ;
Fujita, Shizuo .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2012, 51 (02)
[9]   Sol-gel prepared β-Ga2O3 thin films for ultraviolet photodetectors [J].
Kokubun, Yoshihiro ;
Miura, Kasumi ;
Endo, Fumie ;
Nakagomi, Shinji .
APPLIED PHYSICS LETTERS, 2007, 90 (03)
[10]   A NEW METHOD FOR SYNTHESIS OF EPITAXIAL FILMS OF SILICON CARBIDE ON SAPPHIRE SUBSTRATES (α-Al2O3) [J].
Kukushkin, S. A. ;
Osipov, A., V ;
Redkov, A., V ;
Grashchenko, A. S. ;
Feoktistov, N. A. ;
Fedotov, S. D. ;
Statsenko, V. N. ;
Sokolov, E. M. ;
Timoshenkov, S. P. .
REVIEWS ON ADVANCED MATERIALS SCIENCE, 2018, 57 (01) :82-96