Tungsten Oxide Thin Films for Electrochromic Applications: Pulse Width-Controlled Deposition by High-Power Impulse Magnetron Sputtering

被引:3
|
作者
Najafi-Ashtiani, Hamed [1 ,2 ]
Bilek, Marcela M. [1 ,3 ,4 ,5 ]
Akhavan, Behnam [1 ,3 ,4 ,6 ,7 ]
机构
[1] Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia
[2] Velayat Univ, Fac Basic Sci, Dept Phys, Iranshahr, Iran
[3] Univ Sydney, Sch Biomed Engn, Sydney, NSW 2006, Australia
[4] Univ Sydney, Nano Inst, Sydney, NSW 2006, Australia
[5] Univ Sydney, Charles Perkins Ctr, Sydney, NSW 2006, Australia
[6] Univ Newcastle, Sch Engn, Callaghan, NSW 2308, Australia
[7] Hunter Med Res Inst HMRI, Precis Med Program, New Lambton Hts, NSW 2305, Australia
基金
澳大利亚研究理事会;
关键词
coatings; electrochromics; high-power impulse magnetron sputtering; pulse lengths; tungsten; WO3; ELECTRICAL-PROPERTIES; WO3; FILMS; BAND-GAP; COATINGS; HIPIMS; PERFORMANCE; NANOCOMPOSITE; COLORATION; STABILITY; EVOLUTION;
D O I
10.1002/adem.202301378
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Tungsten oxide (WO3) thin films have been of prime interest among electrochromic materials because of their chemical stability, strong adherence to various substrates, and high coloration efficiency. High-power impulse magnetron sputtering (HiPIMS) holds great potential in fabricating durable WO3-based electrochromic layers. However, the tungsten target-plasma interactions in reactive-HiPIMS deposition of WO3 and their role in modulating the electrochromic function of the resulting WO3 coatings are yet to be understood. Herein, by controlling the HiPIMS pulse length, the stoichiometry of tungsten oxide structures can be tuned to optimize the transparency and electrochromic function of the coatings. X-ray photoelectron spectroscopy data shows that at pulse lengths shorter than 85 mu s, the concentration of suboxide compounds is less than that of tungsten trioxide, while for pulse lengths longer than 100 mu s, this balance is reversed. The average optical transparency of the coatings in the range of visible light is higher than 80%. The optical transmittance modulation (Delta T) of 38.1, 36.2, and 34.3% and coloration efficiency of 41.3, 38.4, and 35.9 cm2 C-1 are measured for the WOx samples deposited at pulse lengths of 70, 85, and 100 mu s, respectively. Tuning the HiPIMS pulse characteristics is a simple strategy to deposit tungsten oxide films with tuned electrochromic properties for an array of applications, from smart windows to wearable displays. This article reports the fabrication of tungsten oxide electrochromic coatings using reactive high-power impulse magnetron sputtering (HiPIMS). Results demonstrate the tunability of tungsten oxide structures via HiPIMS pulse length, optimizing coating transparency and electrochromic properties. Tuning HiPIMS pulse characteristics offers a straightforward approach to deposit tailored tungsten oxide films for diverse engineering applications, including smart windows and wearable displays.image (c) 2024 WILEY-VCH GmbH
引用
收藏
页数:11
相关论文
共 50 条
  • [31] Wettability and corrosion resistance of zirconium nitride films obtained via reactive high-power impulse magnetron sputtering
    Castro, Jose D.
    Pinto, Beatriz
    Ferreira, Fabio
    Serra, R.
    Carvalho, S.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2023, 41 (02):
  • [32] Nanoarchitectonics for Ultrathin Gold Films Deposited on Collagen Fabric by High-Power Impulse Magnetron Sputtering
    Huang, Sheng-Yang
    Hsieh, Ping-Yen
    Chung, Chi-Jen
    Chou, Chia-Man
    He, Ju-Liang
    NANOMATERIALS, 2022, 12 (10)
  • [33] Understanding ion and atom fluxes during high-power impulse magnetron sputtering deposition of NbCx films from a compound target
    Farahani, M.
    Kozak, T.
    Pajdarova, A. D.
    Bahr, A.
    Riedl, H.
    Zeman, P.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2023, 41 (06):
  • [34] Optimization of superconducting niobium nitride thin films via high-power impulse magnetron sputtering
    Horne, Hudson T.
    Hugo, Collin M.
    Reid, Brandon C.
    Santavicca, Daniel F.
    SUPERCONDUCTOR SCIENCE & TECHNOLOGY, 2024, 37 (12)
  • [35] A parametric model for reactive high-power impulse magnetron sputtering of films
    Kozak, Tomas
    Vlcek, Jaroslav
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2016, 49 (05)
  • [36] Microstructure control of CrNx films during high power impulse magnetron sputtering
    Greczynski, G.
    Jensen, J.
    Bohlmark, J.
    Hultman, L.
    SURFACE & COATINGS TECHNOLOGY, 2010, 205 (01) : 118 - 130
  • [37] Effects of film density on electrochromic tungsten oxide thin films deposited by reactive dc-pulsed magnetron sputtering
    Sun, Xilian
    Liu, Zhimin
    Cao, Hongtao
    JOURNAL OF ALLOYS AND COMPOUNDS, 2010, 504 : S418 - S421
  • [38] Influence of Sputtering Power on the Electrical Properties of In-Sn-Zn Oxide Thin Films Deposited by High Power Impulse Magnetron Sputtering
    Li, Zhi-Yue
    Chen, Sheng-Chi
    Huo, Qiu-Hong
    Liao, Ming-Han
    Dai, Ming-Jiang
    Lin, Song-Sheng
    Yang, Tian-Lin
    Sun, Hui
    COATINGS, 2019, 9 (11)
  • [39] Mechanical and anti-corrosion behaviour of ZrNxOy films deposited by Reactive High-Power Impulse Magnetron Sputtering for maritime applications
    Castro, Jose D.
    Evaristo, M.
    Carvalho, S.
    SURFACE & COATINGS TECHNOLOGY, 2023, 473
  • [40] Study of magnetic iron nitride thin films deposited by high power impulse magnetron sputtering
    Tayal, Akhil
    Gupta, Mukul
    Gupta, Ajay
    Ganesan, V.
    Behera, Layanta
    Singh, Surendra
    Basu, Saibal
    SURFACE & COATINGS TECHNOLOGY, 2015, 275 : 264 - 269