Tungsten Oxide Thin Films for Electrochromic Applications: Pulse Width-Controlled Deposition by High-Power Impulse Magnetron Sputtering

被引:3
|
作者
Najafi-Ashtiani, Hamed [1 ,2 ]
Bilek, Marcela M. [1 ,3 ,4 ,5 ]
Akhavan, Behnam [1 ,3 ,4 ,6 ,7 ]
机构
[1] Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia
[2] Velayat Univ, Fac Basic Sci, Dept Phys, Iranshahr, Iran
[3] Univ Sydney, Sch Biomed Engn, Sydney, NSW 2006, Australia
[4] Univ Sydney, Nano Inst, Sydney, NSW 2006, Australia
[5] Univ Sydney, Charles Perkins Ctr, Sydney, NSW 2006, Australia
[6] Univ Newcastle, Sch Engn, Callaghan, NSW 2308, Australia
[7] Hunter Med Res Inst HMRI, Precis Med Program, New Lambton Hts, NSW 2305, Australia
基金
澳大利亚研究理事会;
关键词
coatings; electrochromics; high-power impulse magnetron sputtering; pulse lengths; tungsten; WO3; ELECTRICAL-PROPERTIES; WO3; FILMS; BAND-GAP; COATINGS; HIPIMS; PERFORMANCE; NANOCOMPOSITE; COLORATION; STABILITY; EVOLUTION;
D O I
10.1002/adem.202301378
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Tungsten oxide (WO3) thin films have been of prime interest among electrochromic materials because of their chemical stability, strong adherence to various substrates, and high coloration efficiency. High-power impulse magnetron sputtering (HiPIMS) holds great potential in fabricating durable WO3-based electrochromic layers. However, the tungsten target-plasma interactions in reactive-HiPIMS deposition of WO3 and their role in modulating the electrochromic function of the resulting WO3 coatings are yet to be understood. Herein, by controlling the HiPIMS pulse length, the stoichiometry of tungsten oxide structures can be tuned to optimize the transparency and electrochromic function of the coatings. X-ray photoelectron spectroscopy data shows that at pulse lengths shorter than 85 mu s, the concentration of suboxide compounds is less than that of tungsten trioxide, while for pulse lengths longer than 100 mu s, this balance is reversed. The average optical transparency of the coatings in the range of visible light is higher than 80%. The optical transmittance modulation (Delta T) of 38.1, 36.2, and 34.3% and coloration efficiency of 41.3, 38.4, and 35.9 cm2 C-1 are measured for the WOx samples deposited at pulse lengths of 70, 85, and 100 mu s, respectively. Tuning the HiPIMS pulse characteristics is a simple strategy to deposit tungsten oxide films with tuned electrochromic properties for an array of applications, from smart windows to wearable displays. This article reports the fabrication of tungsten oxide electrochromic coatings using reactive high-power impulse magnetron sputtering (HiPIMS). Results demonstrate the tunability of tungsten oxide structures via HiPIMS pulse length, optimizing coating transparency and electrochromic properties. Tuning HiPIMS pulse characteristics offers a straightforward approach to deposit tailored tungsten oxide films for diverse engineering applications, including smart windows and wearable displays.image (c) 2024 WILEY-VCH GmbH
引用
收藏
页数:11
相关论文
共 50 条
  • [21] Gas Breakdown and Discharge Formation in High-Power Impulse Magnetron Sputtering
    Zuo, Xiao
    Chen, Rende
    Ke, Peiling
    Wang, Aiying
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2019, 47 (02) : 1215 - 1222
  • [22] High-power impulse magnetron sputter deposition of TiBx thin films: Effects of pressure and growth temperature
    Hellgren, Niklas
    Thornberg, Jimmy
    Zhirkov, Igor
    Sortica, Maurico A.
    Petrov, Ivan
    Greene, J. E.
    Hultman, Lars
    Rosen, Johanna
    VACUUM, 2019, 169
  • [23] Study of Niobium Mononitride Thin Films Grown Using High Power Impulse Magnetron Sputtering
    Kalal, Shailesh
    Kumar, Yogesh
    Karmakar, Suman
    Gupta, Surbhi
    Vas, Joseph Vimal
    Rawat, Rajeev
    Gupta, Mukul
    PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, 2022, 16 (02):
  • [24] Multicomponent TixNbCrAl nitride films deposited by dc and high-power impulse magnetron sputtering
    Shu, Rui
    Du, Hao
    Sadowski, Grzegorz
    Dorri, Megan M.
    Rosen, Johanna
    Sortica, Mauricio A.
    Primetzhofer, Daniel
    Lundin, Daniel
    le Febvrier, Arnaud
    Eklund, Per
    SURFACE & COATINGS TECHNOLOGY, 2021, 426
  • [25] High power impulse magnetron sputtering of tungsten: a comparison of experimental and modelling results
    Babu, Swetha Suresh
    Rudolph, Martin
    Ryan, Peter John
    Fischer, Joel
    Lundin, Daniel
    Bradley, James W.
    Gudmundsson, Jon Tomas
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2023, 32 (03)
  • [26] Synthesis of hard diamond-like carbon films by double-pulse high-power impulse magnetron sputtering
    Kimura, Takashi
    Sakai, Kento
    DIAMOND AND RELATED MATERIALS, 2020, 108
  • [27] High-power impulse magnetron sputtering deposition of high crystallinity vanadium dioxide for thermochromic smart windows applications
    Tuan Duc Vu
    Liu, Shiyu
    Zeng, Xianting
    Li, Chuanchang
    Long, Yi
    CERAMICS INTERNATIONAL, 2020, 46 (06) : 8145 - 8153
  • [28] Film characterization of titanium oxide films prepared by high-power impulse magnetron sputtering
    Jing, F. J.
    Yukimura, K.
    Kato, H.
    Lei, Y. F.
    You, T. X.
    Leng, Y. X.
    Huang, N.
    SURFACE & COATINGS TECHNOLOGY, 2011, 206 (05) : 967 - 971
  • [29] Controlling the B/Ti ratio of TiBx thin films grown by high-power impulse magnetron sputtering
    Bakhit, Babak
    Petrov, Ivan
    Greene, J. E.
    Hultman, Lars
    Rosen, Johanna
    Greczynski, Grzegorz
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2018, 36 (03):
  • [30] Epitaxial growth of TiZrNbTaN films without external heating by high-power impulse magnetron sputtering
    Honnali, Sanath Kumar
    Boyd, Robert
    Magnusson, Roger
    le Febvrier, Arnaud
    Lundin, Daniel
    Greczynski, Grzegorz
    Eklund, Per
    SURFACE & COATINGS TECHNOLOGY, 2025, 495