Enhanced thermoelectric performance of SnSe by controlled vacancy population

被引:10
作者
Lee, Ji-Eun [1 ,2 ,3 ,4 ]
Kim, Kyoo [2 ,5 ,6 ]
Nguyen, Van Quang [7 ]
Hwang, Jinwoong [1 ,4 ,8 ]
Denlinger, Jonathan D. [1 ]
Min, Byung Il [6 ]
Cho, Sunglae [7 ]
Ryu, Hyejin [1 ,2 ,3 ]
Hwang, Choongyu [4 ]
Mo, Sung-Kwan [1 ]
机构
[1] Lawrence Berkeley Natl Lab, Adv Light Source, Berkeley, CA 94720 USA
[2] Max Planck POSTECH Hsinchu Ctr Complex Phase Mat, Max Plank POSTECH Korea Res Initiat MPK, Gyeongbuk 37673, South Korea
[3] Korea Inst Sci & Technol, Ctr Spintron, Seoul 02792, South Korea
[4] Pusan Natl Univ, Dept Phys, Busan 46241, South Korea
[5] Korea Atom Energy Res Inst, Daejeon 34057, South Korea
[6] Pohang Univ Sci & Technol POSTECH, Dept Phys, Pohang 37673, South Korea
[7] Univ Ulsan, Energy Harvest Storage Res Ctr, Dept Phys, Ulsan 44610, South Korea
[8] Kangwon Natl Univ, Dept Phys, Chunchon 24341, South Korea
关键词
Thermoelectric; Defect engineering; Electron band structure; Vacancy; SnSe; TEMPERATURE;
D O I
10.1186/s40580-023-00381-7
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The thermoelectric performance of SnSe strongly depends on its low-energy electron band structure that provides high density of states in a narrow energy window due to the multi-valley valence band maximum (VBM). Angle-resolved photoemission spectroscopy measurements, in conjunction with first-principles calculations, reveal that the binding energy of the VBM of SnSe is tuned by the population of Sn vacancy, which is determined by the cooling rate during the sample growth. The VBM shift follows precisely the behavior of the thermoelectric power factor, while the effective mass is barely modified upon changing the population of Sn vacancies. These findings indicate that the low-energy electron band structure is closely correlated with the high thermoelectric performance of hole-doped SnSe, providing a viable route toward engineering the intrinsic defect-induced thermoelectric performance via the sample growth condition without an additional ex-situ process.
引用
收藏
页数:6
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