Latchup Risk in a 4H-SiC Process

被引:0
作者
Ke, Chao-Yang [1 ]
Ker, Ming-Dou [1 ]
机构
[1] Natl Yang Ming Chiao Tung Univ, Inst Elect, Hsinchu 300, Taiwan
关键词
Holding voltage; latchup; SiC; SiC-based integrated circuits (ICs); FEEDBACK REGENERATIVE PROCESS; TRANSIENT POLE METHOD; CMOS LATCHUP;
D O I
10.1109/TED.2024.3372489
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This is the first study related to the latchup issue in the SiC process. In this work, the latchup risk and the holding voltage of the parasitic latchup path have been investigated. The dc holding voltage of the parasitic latchup is only 14.9 V, which is below the voltage rating (20 V) of the devices. The holding voltage measured by the transmission line pulse (TLP) system decreases when the pulsewidth increases, which can be attributed to the self-heating effect on the device. Moreover, the holding voltage measured by TLP decreases as the temperature increases. The methods to prevent latchup events are summarized in this brief. The methods can be divided into two parts. One is the process solution, and the other is the layout solution. Therefore, the design rules for latchup prevention in the SiC process must be developed.
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页码:3424 / 3428
页数:5
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