Temperature dependence of the Ge(111) surface electronic structure probed by inelastic H atom scattering

被引:4
作者
Krueger, Kerstin [1 ]
Hertl, Nils [2 ,4 ]
Wodtke, Alec M. [1 ,2 ,3 ]
Buenermann, Oliver [1 ,2 ,3 ]
机构
[1] Georg August Univ, Inst Phys Chem, D-37077 Gottingen, Germany
[2] Max Planck Inst Multidisciplinary Sci, Dept Dynam Surfaces, D-37077 Gottingen, Germany
[3] Georg August Univ, Int Ctr Adv Studies Energy Convers, D-37077 Gottingen, Germany
[4] Univ Warwick, Dept Chem, Coventry CV4 7AL, England
关键词
PHASE-TRANSITION; HYDROGEN-ATOM; 1050; K; DEEXCITATION; PHOTOEMISSION; SPECTROSCOPY; EXCITATIONS; ABSORPTION; METALS; BAND;
D O I
10.1103/PhysRevMaterials.8.034603
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Experimental methods capable of determining the electronic properties of the surfaces of materials suffer from severe limitations, including interference from bulk electronic states, insensitivity to unoccupied states, and the requirement that the material be conducting. In this work, we introduce inelastic H atom scattering as a tool to probe the electronic structures of surfaces, which can be applied to both conducting and nonconducting samples while exhibiting exceptional surface sensitivity. We illustrate the method for the example of Ge(111). The measurements show a semiconducting surface at low temperature that continuously becomes increasingly metallic at high temperature.
引用
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页数:7
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