Super-resolution Reflection Microscopy via Absorbance Modulation

被引:1
作者
Jain, Parul [1 ]
Geisler, Claudia [1 ]
Leitz, Dennis [2 ]
Udachin, Viktor [3 ]
Nagorny, Sven [4 ]
Weingartz, Thea [4 ]
Adams, Jorg [5 ]
Schmidt, Andreas [4 ]
Rembe, Christian [2 ]
Egner, Alexander [1 ]
机构
[1] Inst Nanophoton Gottingen eV, Dept Opt Nanoscopy, D-37077 Gottingen, Germany
[2] Tech Univ Clausthal, Inst Elect Informat Technol, D-38678 Clausthal Zellerfeld, Germany
[3] Tech Univ Clausthal, Clausthal Ctr Mat Technol, D-38678 Clausthal Zellerfeld, Germany
[4] Tech Univ Clausthal, Inst Organ Chem, D-38678 Clausthal Zellerfeld, Germany
[5] Tech Univ Clausthal, Inst Phys Chem, D-38678 Clausthal Zellerfeld, Germany
来源
ACS NANOSCIENCE AU | 2023年 / 3卷 / 05期
关键词
Nanoscopy; super-resolution; reflectionmicroscopy; absorbance modulation imaging (AMI); absorbance modulationlayer (AML); RESOLUTION; LIGHT;
D O I
10.1021/acsnanoscienceau.3c00013
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In recent years, fluorescence microscopy has been revolutionized. Reversible switching of fluorophores has enabled circumventing the limits imposed by diffraction. Thus, resolution down to the molecular scale became possible. However, to the best of our knowledge, the application of the principles underlying super-resolution fluorescence microscopy to reflection microscopy has not been experimentally demonstrated. Here, we present the first evidence that this is indeed possible. A layer of photochromic molecules referred to as the absorbance modulation layer (AML) is applied to a sample under investigation. The AML-coated sample is then sequentially illuminated with a one-dimensional (1D) focal intensity distribution (similar to the transverse laser mode TEM01) at wavelength lambda(1) = 325 nm to create a subwavelength aperture within the AML, followed by illumination with a Gaussian focal spot at lambda(2) = 633 nm for high-resolution imaging. Using this method, called absorbance modulation imaging (AMI) in reflection, we demonstrate a 2.4-fold resolution enhancement over the diffraction limit for a numerical aperture (NA) of 0.65 and wavelength (lambda) of 633 nm.
引用
收藏
页码:375 / 380
页数:6
相关论文
共 30 条
[1]   Confining Light to Deep Subwavelength Dimensions to Enable Optical Nanopatterning [J].
Andrew, Trisha L. ;
Tsai, Hsin-Yu ;
Menon, Rajesh .
SCIENCE, 2009, 324 (5929) :917-921
[2]  
[Anonymous], 2008, Materials Characterization and Analysis of the Marquette Interchange HMA Perpetual Pavement
[3]   Modern Statistical Challenges in High-Resolution Fluorescence Microscopy [J].
Aspelmeier, Timo ;
Egner, Alexander ;
Munk, Axel .
ANNUAL REVIEW OF STATISTICS AND ITS APPLICATION, VOL 2, 2015, 2 :163-202
[4]   Development of Desirable Fine Ferrite Grain Size and Random Second Phase Dual-Phase Steel Microstructures Using Composition and/or Processing Modifications [J].
Bandi, Bharath ;
Slater, Carl ;
Farrugia, Didier ;
Davis, Claire .
METALS, 2022, 12 (07)
[5]   Technological advances in super-resolution microscopy to study cellular processes [J].
Bond, Charles ;
Santiago-Ruiz, Adriana N. ;
Tang, Qing ;
Lakadamyali, Melike .
MOLECULAR CELL, 2022, 82 (02) :315-332
[6]  
Brandon D., 2008, Microstructural Characterizationof Materials, V2
[7]   Modern Scattering-Type Scanning Near-Field Optical Microscopy for Advanced Material Research [J].
Chen, Xinzhong ;
Hu, Debo ;
Mescall, Ryan ;
You, Guanjun ;
Basov, D. N. ;
Dai, Qing ;
Liu, Mengkun .
ADVANCED MATERIALS, 2019, 31 (24)
[8]   BREAKING THE DIFFRACTION RESOLUTION LIMIT BY STIMULATED-EMISSION - STIMULATED-EMISSION-DEPLETION FLUORESCENCE MICROSCOPY [J].
HELL, SW ;
WICHMANN, J .
OPTICS LETTERS, 1994, 19 (11) :780-782
[9]   RESOLUTION OF ANNULAR-PUPIL OPTICAL-SYSTEMS [J].
HORIKAWA, Y .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 1994, 11 (07) :1985-1995
[10]   Photochromism of Diarylethene Molecules and Crystals: Memories, Switches, and Actuators [J].
Irie, Masahiro ;
Fulcaminato, Tuyoshi ;
Matsuda, Kenji ;
Kobatake, Seiya .
CHEMICAL REVIEWS, 2014, 114 (24) :12174-12277