Realization of all two-dimensional Bravais lattices with metasurface-based interference lithography

被引:3
|
作者
Kim, Myungjoon [1 ]
Kim, Nayoung [1 ]
Shin, Jonghwa [1 ]
机构
[1] Korea Adv Inst Sci & Technol, Daejeon, South Korea
基金
新加坡国家研究基金会;
关键词
metasurface; interference lithography; proximity-field nanopatterning; adjoint method; 3-DIMENSIONAL NANOSTRUCTURES; EXPOSURE;
D O I
10.1515/nanoph-2023-0786
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Proximity-field nanopatterning (PnP) have been used recently as a rapid, cost-effective, and large-scale fabrication method utilizing volumetric interference patterns generated by conformal phase masks. Despite the effectiveness of PnP processes, their design diversity has not been thoroughly explored. Here, we demonstrate that the possibility of generating any two-dimensional lattice with diverse motifs. By controlling the amplitude, phase, and polarization of each diffraction beam, we can implement all two-dimensional Bravais lattices in three-dimensional space. The results may provide diverse applications that require three-dimensional nanostructures from optical materials and structural materials to energy storage or conversion materials.
引用
收藏
页码:1467 / 1474
页数:8
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