Analysis of carrier recombination coefficients of 3C-and 6H-SiC: Insights into recombination mechanisms in stacking faults of 4H-SiC

被引:6
作者
Tanaka, Kazuhiro [1 ]
Kato, Masashi [1 ]
机构
[1] Nagoya Inst Technol, Dept Elect & Mech Engn, Nagoya 4668555, Japan
关键词
AUGER RECOMBINATION; EPITAXIAL LAYERS; ABSORPTION; DEFECTS;
D O I
10.1063/5.0157696
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In recent years, 4H-SiC power devices have been widely employed in power electronic systems owing to their superior performance to Si power devices. However, stacking faults in 4H-SiC can degrade the device performance. Stacking faults can be considered as polytype inclusions in 4H-SiC. Carrier recombination in stacking faults is considered a cause for performance degradation. Understanding carrier recombination in different polytypes other than 4H-SiC can be helpful in understanding the mechanism of performance degradation due to stacking faults in 4H-SiC. Therefore, in this study, we characterized the recombination coefficients of 3C- and 6H-SiC and compared them with those of 4H-SiC using the time-resolved free-carrier absorption measurement method. Recombination at the stacking faults in 4H-SiC cannot be considered as the intrinsic recombination of inclusions of other polytypes.
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页数:4
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